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Author: vivek prabhu

Displaying records 31 to 40 of 78 records.
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31. FTIR measurements of compositional heterogeneities
Published: 2/25/2007
Authors: Shuhui Kang, B D. Vogt, Wen-Li Wu, Vivek M Prabhu, David Lloyd VanderHart, Ashwin Rao, Eric K Lin, Karen Turnquest
Abstract: A general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy has been demonstrated Polymer films with varying degrees of heterogeneity were prepared using a model chemically ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852722

32. Identifying Materials Limits of Chemically Amplified Photoresists
Published: 2/25/2007
Authors: Wen-Li Wu, Vivek M Prabhu, Eric K Lin
Abstract: Chemically amplified photoresists are likely to remain the primary imaging materials for the semiconductor industry. As feature sizes decrease to dimensions comparable to the characteristic size of the molecules in the photoresist, a significant cha ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852749

33. Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy
Published: 2/9/2007
Authors: Shuhui Kang, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, David Lloyd VanderHart, Ashwin Rao, Karen Turnquest
Abstract: We demonstrate a general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy. Polymer films with varying degrees of heterogeneity were prepared using a model chemically ampl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852648

34. Influence of Base Additives on the Reaction Diffusion Front of Model Chemically Amplified Photoresists
Published: 1/11/2007
Authors: B D. Vogt, Shuhui Kang, Vivek M Prabhu, Ashwin Rao, Eric K Lin, Sushil K Satija, Karen Turnquest, Wen-Li Wu
Abstract: The effects of amine base quencher on the photoacid catalyzed deprotection reaction-diffusion front in model photoresists was measured by combination of neutron reflectivity and Fourier transform infrared spectroscopy. Modulation in the location of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852647

35. Exposure Dose Effects on the Reaction-Diffusion Process in Model extreme ultraviolet Photoresists
Published: 11/30/2006
Authors: Kristopher Lavery, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, Kwang-Woo Choi
Abstract: The effect of exposure dose on the latent image deprotection profile in a model extreme ultraviolet (EUV) photoresist polymer, poly(hydroxystyrene-co-d9-tert-butyl acrylate), is measured with neutron reflectometry. As the photoacid concentration is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852653

36. Quantitative depth profiling of photoacid generators in photoresist materials by near-edge x-ray absorption fine structure spectroscopy
Published: 11/15/2006
Authors: Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Linda K Sundberg, Robert D Allen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854199

37. The Effect of Deprotection Extent on Swelling and Dissolution Regimes of Thin Polymer Films
Published: 10/28/2006
Authors: Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, M Muthukumar
Abstract: The response of unentangled polymer thin films to aqueous hydroxide solutions is measured as a function of increasing weakly-acidic methacrylic acid comonomer content produced by an in-situ reaction-diffusion process. Quartz crystal microbalance wit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852637

38. Measurements of the Reaction-Diffusion Front of Model Chemically Amplified Photoresists With Varying Photoacid Size
Published: 10/26/2006
Authors: B D. Vogt, Shuhui Kang, Vivek M Prabhu, Eric K Lin, Sushil K Satija, Karen Turnquest, Wen-Li Wu
Abstract: Neutron reflectivity and Fourier transform infrared spectroscopy measurements are used to profile the deprotection reaction-diffusion front with a nanometer resolution in a model photoresist polymer using three perfluoroalkane-based photoacid generat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852650

39. Deprotection Kinetics in 193 nm Photoresist Thin Films: Influence of Copolymer Content
Published: 7/25/2006
Authors: Shuhui Kang, Vivek M Prabhu, B D. Vogt, Eric K Lin, Wen-Li Wu, Karen Turnquest
Abstract: The reaction-diffusion mechanism of photoacids is dependent upon many variables including the reaction rate, size of the acid counterion species and temperature. Recent experiments have demonstrated the acid diffusion can be controlled by a combinat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852550

40. Effect of Copolymer Composition on Acid Catalyzed Deprotection Reaction Kinetics in Model Photoresists
Published: 6/25/2006
Authors: Shuhui Kang, Vivek M Prabhu, B D. Vogt, Eric K Lin, Wen-Li Wu, Karen Turnquest
Abstract: The kinetics of an acid-catalyzed deprotection reaction in model photoresist materials was studied as a function of copolymer composition with Fourier Transform Infrared spectroscopy. A mathematical model was developed to analyze the acid catalyzed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852623



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