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Author: james potzick

Displaying records 31 to 40 of 61 records.
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31. Measurement Uncertainty and Noise in Nanometrology
Published: 1/1/1999
Author: James Edward Potzick
Abstract: The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820946

32. Noise averaging and measurement resolution (or a "little noise is a good thing")
Published: 1/1/1999
Author: James Edward Potzick
Abstract: When a continuous quantity is measured with a digital instrument or digitized for further processing, a measurement uncertainty component is incurred from quantization of the continuous variable. This uncertainty can be reduced by oversampling and av ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820947

33. Accuracy Differences Among Photomask Metrology Tools and Why They Matter
Published: 12/1/1998
Author: James Edward Potzick
Abstract: A variety of different kinds of photomask critical dimensions (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have different cost, throughput, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820908

34. Accuracy Differences Among Photomask Metrology Tools--and Why They Matter
Published: 9/1/1998
Author: James Edward Potzick
Abstract: A variety of different kinds of photomask critical dimension (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have differing cost, throughput, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823105

35. Accuracy and Traceability in Dimensional Measurements
Published: 6/1/1998
Author: James Edward Potzick
Abstract: Dimensional measurements of importance to microlithography include feature sizes and feature placement on photomasks and wafers, overlay eccentricities, defect and particle sizes on masks and wafers, and many others. A common element is that the obje ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820907

36. A Method to Characterize Overlay Tool Misalignments and Distortions
Published: 7/1/1997
Authors: Richard M Silver, James Edward Potzick, Fredric Scire, Christopher J. Evans, Michael L McGlauflin, Edward A Kornegay, Robert D. Larrabee
Abstract: A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820873

37. Photomask Metrology in the Era of Neolithography
Published: 2/1/1997
Author: James Edward Potzick
Abstract: The appearance of smaller photomask feature sizes, high density patterns, and optical enhancements such as phase shifters and OPC features, and the increasing importance of subresolution mask characteristics, can render traditional mask metrology tec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820870

38. Antireflecting-Chromium Linewidth Standard, SRM 473, for Calibration of Optical Microscope Linewidth Measuring System
Series: Technical Note (NIST TN)
Report Number: 260
Published: 1/1/1997
Author: James Edward Potzick
Abstract: This document describes the physical characteristics of Standard Reference Material SRM 473, provides instructions for its use in calibrating optical photomask linewidth measuring systems, and gives information and precautions concerning its care and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820868

39. Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6036
Published: 1/1/1997
Authors: Richard M Silver, J Land, Jack A Stone Jr, Ronald G Dixson, Bryon S. Faust, James Edward Potzick, Michael T Postek, et al
Abstract: A cross-section of measurements from the Precision Engineering Division within the National Institute of Standards and Technology is benchmarked against other leading National Measurement Institutes. We present a variety of length-related calibration ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820872

40. New NIST-Certified Small Scale Pitch Standard
Published: 1/1/1997
Author: James Edward Potzick
Abstract: The National Institute of Standards and Technology is developing a dimensional pitch standard covering the range 1 ?m to 10 mm, intended for the calibration of microscope magnification and dimensional metrology instrument scales. While NIST has long ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820869



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