NIST logo

Publications Portal

You searched on:
Author: james potzick

Displaying records 11 to 20 of 61 records.
Resort by: Date / Title


11. Photomask Applications of Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 10/1/2007
Authors: Ronald G Dixson, Ndubuisi George Orji, James Edward Potzick, Joseph Fu, Michael W Cresswell, Richard A Allen, S J Smith, Anthony J Walton
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in AFM dimensional metrology.  Two major instruments are being used for traceable measurements.  The first is a custom in-house metrology AFM, called the c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823242

12. Accuracy in Optical Image Modeling
Published: 2/26/2007
Authors: James Edward Potzick, Egon Marx, M P Davidson
Abstract: Wafer exposure process simulation and optical photomask feature metrology both rely on optical image modeling for accurate results. The best way to gauge the accuracy of an imaging model is to compare the model results with an actual image. Modeling ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822704

13. Parametric Uncertainty in Optical Image Modeling
Published: 9/18/2006
Authors: James Edward Potzick, Egon Marx, M P Davidson
Abstract: Optical photomask feature metrology and wafer exposure process simulation both rely on optical image modeling for accurate results. While it is fair to question the accuracies of the available models, model results also depend on several input parame ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822703

14. A Benefit/Cost Model for Metrology in Manufacturing
Published: 10/24/2005
Author: James Edward Potzick
Abstract: Every measurement of a feature's size or placement on a wafer or photomask is made for a reason. Usually a measurement leads to a decision, often involving a process adjustment or business transaction, and there are costs and benefits attached to the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822366

15. Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Published: 7/3/2005
Authors: Egon Marx, James Edward Potzick
Abstract: Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer. When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822388

16. Photomask Feature Metrology
Published: 4/7/2005
Author: James Edward Potzick
Abstract: This chapter discusses some general issues with regard to measurement of the size and placement of the features on a photomask.<br>Since all linewidth and placement measurements derive from the location of a feature's edges, the Chapter sta ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822363

17. Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Published: 1/1/2005
Authors: Egon Marx, James Edward Potzick
Abstract: Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer.  When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822252

18. Improving the Uncertainty of Photomask Linewidth Measurements
Published: 5/1/2004
Authors: J Pedulla, James Edward Potzick, Richard M Silver
Abstract: The National Institute of Standards and Technology (NIST) is currently developing a photomask linewidth standard (SRM 2059) with a lower expected uncertainty of calibration than the previous NIST standards (SRMs 473, 475, 476). In calibrating these s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822175

19. Development of Photomask Artifacts and Metrology for the 65 nm Device Generation with Extensibility Beyond
Published: 1/1/2004
Authors: Andras Vladar, Richard M Silver, James Edward Potzick, John S Villarrubia
Abstract: The purpose of this project was to explore the currently used mask metrology methods and tools, to further develop mask metrology, and to design, fabricate and measure a new, relevant, 193 nm phase shifting mask metrology mask. These tasks were succe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822365

20. Optical Photomask CD Metrology at NIST
Published: 11/1/2003
Author: James Edward Potzick
Abstract: Our customers usually measure mask features in order to make a business decision, such as whether or not to ship a mask to a customer. A simple cost/benefit model for mask CD metrology shows there is an optimum measurement uncertainty which will maxi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822364



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series