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Author: heather patrick
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1. A Traceable Scatterometry Measurement of a Silicon Line Grating
Published: 5/26/2011
Authors: Thomas Avery Germer, Heather J Patrick, Ronald G Dixson
Abstract: In this paper, we present a spectroscopic Mueller matrix ellipsometry measurement of a silicon line grating with nominal pitch of 600 nm and line width 100 nm. An uncertainty analysis is performed on the measurement results. The results are compare ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908506

2. BRDF measurements of graphite used in high-temperature fixed point blackbody radiators: a multi-angle study at 405 nm and 658 nm
Published: 3/12/2012
Authors: Heather J Patrick, Leonard M Hanssen, Jinan Zeng, Thomas Avery Germer
Abstract: We have measured angle- and polarization-resolved, hemispherical bidirectional reflectance distribution function (BRDF) for two types of graphite used in the fabrication of high temperature fixed point (HTFP) blackbody cavities. Measurements were m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909520

3. Developing an Uncertainty Analysis for Optical Scatterometry
Published: 8/3/2009
Authors: Thomas Avery Germer, Heather J Patrick, Richard M Silver, Benjamin Bunday
Abstract: This article describes how an uncertainty analysis may be performed on a scatterometry measurement. A method is outlined for propagating uncertainties through a least-squares regression. The method includes the propagation of the measurement noise as ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901617

4. Effect of Bandwidth and Numerical Aperture in Optical Scatterometry
Published: 3/1/2010
Authors: Thomas Avery Germer, Heather J Patrick
Abstract: We consider the effects of finite spectral bandwidth and numerical aperture in scatterometry measurements and discuss efficient integration methods based upon Gaussian quadrature in one dimension (for spectral bandwidth averaging) and two dimensions ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905013

5. Extending the Limits of Image-Based Optical Metrology
Published: 6/20/2007
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, Michael T. Stocker, Egon Marx, Heather J Patrick
Abstract: We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered in combination with appropriately designed metrology targets. Previously we reported results from samples with sub-50 nm sized fea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823218

6. Extraction of trench geometry and linewidth of nanoscale grating targets in (110)-oriented silicon using angle-resolved scatterometry
Published: 6/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Michael W Cresswell, Bin Li, Huai Huang, Paul S. Ho
Abstract: The extraction of nanoscale dimensions and feature geometry of grating targets using signature-based optical techniques is an area of continued interest in semiconductor manufacturing. In the current work, we have performed angle-resolved scatterome ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842548

7. In situ measurement of annealing-induced line shape decay in nanoimprinted polymers using scatterometry
Published: 3/2/2009
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun Wook Ro, Lee J Richter, Christopher L Soles
Abstract: Thermal embossing nanoimprint lithography (NIL) is an area of continuing interest because it allows direct patterning of nanoscale structures into a wide variety of functional polymer materials. Measuring the shape evolution of nanoimprinted lines d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901568

8. Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications
Published: 9/30/2007
Authors: Heather Patrick, Thomas Avery Germer, Michael W Cresswell, Richard A Allen, Ronald G Dixson, Michael Bishop
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32756

9. Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications
Published: 5/7/2007
Authors: Heather J Patrick, Thomas Avery Germer, Michael W Cresswell, Richard A Allen, Ronald G Dixson, Michael R Bishop
Abstract: We use an optical critical dimension technique, matching modeled to measured scatterometry signatures, to obtain critical dimension linewidth on grating targets fabricated using the single-crystal critical dimension reference materials process. The ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841085

10. Modeling the Effect of Finite Size Gratings on Scatterometry Measurements
Published: 2/25/2008
Authors: Elizabeth Kenyon, Michael W Cresswell, Heather J Patrick, Thomas Avery Germer
Abstract: The interpretation of scatterometry measurements generally assumes that the grating extends over an area large enough to intercept all the illumination provided by an incident beam.  However, in practice, the grat-ings used in scatterometry are ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32956



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