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1. Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library
Published: 7/1/2015
Authors: John S Villarrubia, Andras Vladar, Bin Ming, Regis J Kline, Daniel Franklin Sunday, Jasmeet Chawla, Scott List
Abstract: The width and shape of 10 nm to 12 nm wide lithographically patterned SiO2 lines were measured in the scanning electron microscope by fitting the measured intensity vs. position to a physics-based model in which the lines‰ widths and shapes are param ...

2. Optimizing Hybrid Metrology: Rigorous Implementation of Bayesian and Combined Regression
Published: 3/19/2015
Authors: Mark Alexander Henn, Richard M Silver, Nien F Zhang, Hui Zhou, Bryan M Barnes, Bin Ming, Andras Vladar, John S Villarrubia
Abstract: Hybrid metrology, e.g. the combination of several measurement techniques to determine critical dimensions, is an important approach to meet the needs of semiconductor industry. A proper use of hybrid metrology may not only yield more reliable estimat ...

3. New Insights into Subsurface Imaging of Carbon Nanotubes in Polymer Composites via Scanning Electron Microscopy
Published: 2/4/2015
Authors: Minhua Zhao, Bin Ming, Jae-Woo Kim, Luke J Gibbons, Xiaohong Gu, Tinh Nguyen, Cheol Park, Peter T Lillehei, John S Villarrubia, Andras Vladar, James Alexander Liddle
Abstract: Despite many studies of subsurface imaging of carbon nanotube (CNT)-polymer composites via scanning electron microscopy (SEM), significant controversy exists concerning the imaging depth and contrast mechanisms. We studied CNT-polyimide composites an ...

4. 10 nm Three-Dimensional CD-SEM Metrology
Published: 4/10/2014
Authors: Andras Vladar, John S Villarrubia, Bin Ming, Regis J Kline, Jasmeet Chawla, Scott List, Michael T Postek
Abstract: The shape and dimensions of a challenging pattern have been measured using a model-based library scanning electron microscope (MBL SEM) technique. The sample consisted of a 4-line repeating pattern. Lines were narrow (10 nm), asymmetric (different ...

5. Documentation for Reference Material (RM) 8820: A Versatile, Multipurpose Dimensional Metrology Calibration Standard for Scanned Particle Beam, Scanned Probe and Optical Microscopy
Series: Special Publication (NIST SP)
Report Number: 1170
Published: 2/3/2014
Authors: Michael T Postek, Andras Vladar, Bin Ming, Bunday Benjamin
Abstract: Reference Material (RM) 8820 is a multipurpose instrument calibration standard available from NIST. This is a dimensional standard initially developed to replace the out of stock RM 8090 used for X and Y scale calibrations of scanned particle beam mi ...

6. Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...

7. Development of the Metrology and Imaging of Cellulose Nanocrystals
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, John A Dagata, Natalia Farkas, Bin Ming, Ryan Wagner, Arvind Raman, Robert J Moon, Ronald Sabo, Theodore H Wegner, James Beecher
Abstract: The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNC) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement ...

8. Review of Current Progress in Nanometrology with Helium Ions
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, Bin Ming, Charles Archie
Abstract: Scanning electron microscopy has been employed as an imaging and measurement tool for more than 50 years and it continues as a primary tool in many research and manufacturing facilities across the world. A new challenger to this work is the helium ...

9. Accurate Nanometer-Scale Imaging and Measurements with SEM
Published: 8/18/2011
Authors: Bradley N Damazo, Bin Ming, Premsagar Purushotham Kavuri, Andras Vladar, Michael T Postek
Abstract: Scanning electron microscopes (SEMs) are incredibly versatile instruments for millimeter to nanometer scale imaging and measurements of size and shape. New methods to improve repeatability and accuracy have been implemented on the so-called Referenc ...

10. Recent Progress in Understanding the Imaging and Metrology using the Helium Ion Microscope
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of t ...

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