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Author: eric lin
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Displaying records 1 to 10 of 198 records.
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1. Photoresist latent and developer images as probed by neutron reflectivity methods
Published: 9/16/2010
Authors: Vivek M Prabhu, Shuhui Kang, David Lloyd VanderHart, Eric K Lin, Wen-Li Wu
Abstract: Photoresist materials enable the fabrication of advanced integrated circuits with ever decreasing feature sizes. As next-generation light sources are developed, using extreme ultraviolet light of wavelength 13.5 nm, these highly-tuned formulations m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902742

2. Measuring the extent of phase separation in P3HT/PCBM photovoltaic blends with 1H spin diffusion NMR spectroscopy
Published: 4/5/2010
Authors: Ryan C Nieuwendaal, Chad R Snyder, Regis J Kline, Eric K Lin, David Lloyd VanderHart, Dean M DeLongchamp
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903680

3. Thin Film Solid State Proton NMR Measurements Using A Synthetic Mica Substrate: Polymer Blends
Published: 8/25/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Kristopher Lavery, Cindi L Dennis, Ashwin Rao, Eric K Lin
Abstract: We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton nuclear magnetic resonance (NMR) experiments. The context of this w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900180

4. Methodology for quantitative measurements of multilayer polymer thin films with IR spectroscopic ellipsometry
Published: 7/2/2009
Authors: Shuhui Kang, Vivek M Prabhu, Christopher Soles, Eric K Lin, Wen-Li Wu
Abstract: A new methodology to quantify the sensitivity and resolution of infrared variable angle spectroscopic ellipsometry (IRSE) measurements was developed for probing the depth profile of composition in thin polymer films. A multilayer system comprised of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902197

5. Low-temperature plasma assisted nanotransfer printing between thermoplastic polymers
Published: 3/26/2009
Authors: Deuk Y. Lee, Daniel R. Hines, Christopher M Stafford, Christopher Soles, Eric K Lin, Gottlieb Oehrlein
Abstract: we performed a survey of the factors controlling the changes of the adhesion characteristics for PMMA and PET surfaces upon plasma activation of the respective interfaces for nanotransfer printing. Polar active functional groups introduced by plasma ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854423

6. Controlling the Formation and Orientation of Terraced Nanoscale Ribbons of a Thiophene-Based Copolymer
Published: 3/24/2009
Authors: Dean M DeLongchamp, Regis J Kline, Youngsuk Jung, David Germack, Eric K Lin, Andrew Moad, Lee J Richter, Michael F. Toney, Martin Heeney, Iain McCulloch
Abstract: Terraced nanoscale ribbon domains of a poly(2,5-bis(3-alkylthiophen-2-yl) thieno[3,2-b]thiophene) form after thin films are cooled from its highest-temperature phase. A simple flow coating procedure can induce high levels of ribbon orientation and e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854094

7. Small Angle X-Ray Scattering Measurements of Spatial Dependent Linewidth in Dense Nanoline Gratings
Published: 3/16/2009
Authors: Chengqing C. Wang, Wei-En Fu, Bin Li, Huai Huang, Christopher Soles, Eric K Lin, Wen-Li Wu, Paul S. Ho, Michael W. Cresswell
Abstract: Small angle X-ray scattering (SAXS) was used to characterize the line cross section of nanoline gratings fabricated using electron beam lithography (EBL) patterning followed by anisotropic wet etching into silicon single crystal. SAXS results at nor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854130

8. Characterization of the Photoacid Diffusion Length
Published: 2/27/2009
Authors: Shuhui Kang, Vivek M Prabhu, Wen-Li Wu, Eric K Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh
Abstract: The photoacid diffusion length is a critical issue for EUV photoresists and photolithography because it governs critical dimension (CD), line-edge-roughness (LER) and line-width-roughness (LWR). This paper provides an approach to characterize the pho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902190

9. The molecular basis of mesophase ordering in a thiophene-based copolymer
Published: 2/18/2009
Authors: Dean M DeLongchamp, Regis J Kline, Youngsuk Jung, Eric K Lin, Daniel A Fischer, David J Gundlach, Andrew Moad, Lee J Richter, Michael F. Toney, Martin Heeney, Iain McCulloch
Abstract: The carrier mobility of poly(2,5-bis(3-alkylthiophen-2-yl) thieno[3,2-b]thiophene) semiconductors can be substantially enhanced after heating through a thermotropic mesophase transition, which causes a significant improvement in thin film structural ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852781

10. Well-Ordered Polymer Melts with 5 nm Lamellar Domains from Blends of a Disordered Block Copolymer and a Selectively Associating Homopolymer of Low or High Molar Mass
Published: 10/16/2008
Authors: Vijay Tirumala, August W. Bosse, Eric K Lin, Vikram Daga, Alvin Romang, Jan Ilavsky, J J. Watkins
Abstract: The use of short chain block copolymer melts as nanostructured templates for sub-10 nm domains is often limited by their low segregation strength (N). Since increasing molar mass to strengthen segregation also increases the interdomain spacin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853626



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