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Author: john kramar

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51. Measurement of Patterned Film Linewidth for Interconnect Characterization
Published: 1/1/1995
Authors: L Linholm, Robert Allen, Michael W Cresswell, Rathindra Ghoshtagore, S Mayo, H Schafft, John A Kramar
Abstract: The results from high-quality electrical and physical measurements on the same cross-bridge resistor test structure with approximately vertical sidewalls have shown differences in linewidth as great as 90 nm for selected conductive films. These diffe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820744

52. Hertzian Contact Resonances
Published: 1/1/1994
Authors: John A Kramar, T Mcwaid, J Schneir, E Clayton Teague
Abstract: The resonant frequency of a sphere in contact with a flat surface was measured as a function of loading force for contacting materials with different elastic moduli. Comparisons were made with predictions based on the Hertzian theory of elastic defor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820686

53. Metrology Standards For Advanced Semiconductor Lithography Referenced to Atomic Spacings and Geometry
Published: 12/31/1993
Authors: E Clayton Teague, Loren W. Linholm, Michael W Cresswell, William B. Penzes, John A Kramar, Fredric Scire, John S Villarrubia, Jay Shi Jun
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2653

54. Electronic Limitations in Phase Meters for Heterodyne Interferometry
Published: 7/1/1993
Authors: Nile M. Oldham, John A Kramar, P. S. Hetrick, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=22814

55. Electronic Limitations in Phase Meters for Heterodyne Interferometry
Published: 10/1/1991
Authors: Nile M. Oldham, P. S. Hetrick, John A Kramar, William B. Penzes, T. Wheatley, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=22839



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