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You searched on: Author: john kramar

Displaying records 51 to 58.
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51. Toward Nanometer Accuracy Measurements
Published: 6/1/1999
Authors: John A Kramar, E Amatucci, David E. Gilsinn, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli ...

52. The Molecular Measuring Machine
Published: 1/1/1998
Authors: John A Kramar, E Gilsinn, E Amatucci, C Villarrubia, E Clayton Teague, W Scire, William B. Penzes
Abstract: To help meet the measurement needs of industries preparing to manufacture future generations of nanoelectronic devices and circuits, the National Institute of Standards and Technology (NIST) has designed and built an instrument¿called the Molecular ...

53. Measurement of Patterned Film Linewidth for Interconnect Characterization
Published: 12/31/1995
Authors: Loren W. Linholm, Richard A Allen, Michael W. Cresswell, Rathindra Ghoshtagore, Santos D Mayo, Harry A. Schafft, John A Kramar, E Clayton Teague

54. Measurement of Patterned Film Linewidth for Interconnect Characterization
Published: 1/1/1995
Authors: L Linholm, Robert Allen, Michael W. Cresswell, Rathindra Ghoshtagore, S Mayo, H Schafft, John A Kramar
Abstract: The results from high-quality electrical and physical measurements on the same cross-bridge resistor test structure with approximately vertical sidewalls have shown differences in linewidth as great as 90 nm for selected conductive films. These diffe ...

55. Hertzian Contact Resonances
Published: 1/1/1994
Authors: John A Kramar, T Mcwaid, J Schneir, E Clayton Teague
Abstract: The resonant frequency of a sphere in contact with a flat surface was measured as a function of loading force for contacting materials with different elastic moduli. Comparisons were made with predictions based on the Hertzian theory of elastic defor ...

56. Metrology Standards For Advanced Semiconductor Lithography Referenced to Atomic Spacings and Geometry
Published: 12/31/1993
Authors: E Clayton Teague, Loren W. Linholm, Michael W. Cresswell, William B. Penzes, John A Kramar, Fredric Scire, John S Villarrubia, Jay Shi Jun

57. Electronic Limitations in Phase Meters for Heterodyne Interferometry
Published: 7/1/1993
Authors: Nile M. Oldham, John A Kramar, P. S. Hetrick, E Clayton Teague

58. Electronic Limitations in Phase Meters for Heterodyne Interferometry
Published: 10/1/1991
Authors: Nile M. Oldham, P. S. Hetrick, John A Kramar, William B. Penzes, T. Wheatley, E Clayton Teague

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  • SP 250-XX: Calibration Services
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