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Author: john kramar

Displaying records 21 to 30 of 55 records.
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21. Active Vibration Isolation of a Large Stroke Scanning Probe Microscope by Using Discrete Sliding Mode Control
Published: 5/31/2005
Authors: J Y Yen, K J Lan, John A Kramar
Abstract: Active vibration isolation is gaining increased attention in the ultra high precision applications to effectively treat the unavoidable ground vibration. The use of active vibration isolation is now being explored for the Molecular Measuring Machine ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822381

22. Metrologies for Quantitative Nanomechanical Testing and Quality Control in Semiconductor Manufacturing
Published: 2/1/2005
Authors: Jon Robert Pratt, John A Kramar, David B Newell, Douglas T Smith
Abstract: If nanomechanical testing is to evolve into a tool for process and quality control in semiconductor fabrication, great advances in throughout, repeatability, and accuracy of the associated instruments and measurements will be required. A recent gran ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822080

23. Sliding Mode Control for Active Vibration Isolation of a Long Range Scanning Tunneling Microscope
Published: 10/29/2004
Authors: K J Lan, James H Yen, John A Kramar
Abstract: An active vibration isolation (AVI) system has been designed and implemented for the Molecular Measuring Machine (M3) at the National Institute of Standards and Technology (NIST). NIST is investigating active vibration isolation as an approach to imp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822380

24. Realizing and Disseminating the SI Micronewton With the Next Generation NIST Electrostatic Force Balance
Published: 10/1/2004
Authors: Richard Seugling, David B Newell, John A Kramar, Jon Robert Pratt
Abstract: The NIST Electrostatic Force Balance (EFB) compares deadweight and mechanical probe forces to an SI realization of force derived from measurements of the capacitance gradient and voltage in an electronic null balance. In the following abstract, we br ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822393

25. Active Vibration Isolation for a Long-Range Scanning Tunneling Microscope
Published: 6/1/2004
Authors: K J Lan, J Y Yen, John A Kramar
Abstract: Vibration Isolation or control is critical for the optimum operation of the Molecular Measuring Machine (M3), a high-resolution, length-metrology instrument at the National Institute of Standards and Technology. This paper describes the extension of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822400

26. Progress Towards SI Traceable Force Metrology for Nanomechanics
Published: 1/1/2004
Authors: David B Newell, Eric Paul Whitenton, John A Kramar, Jon Robert Pratt, Douglas T Smith
Abstract: This paper is based, in its entirety, on NIST-approved publications: Calibration of Piezoresistive Cantilever Force Sensors Using the NIST Electrostatic Force Balance, The NIST Electrostatic Force Balance Experiment, The NIST Microforce Realization a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822096

27. Progress Towards Systeme International d'Unites Traceable Force Metrology for Nanomechanics
Published: 1/1/2004
Authors: Jon Robert Pratt, Douglas T Smith, David B Newell, John A Kramar, Eric Paul Whitenton
Abstract: Recent experiments with the National Institute of Standards and Technology (NIST) Electrostatic Force Balance (EFB) have achieved agreement between an electrostatic force and a gravitational force of 10^(-5) N to within a few hundred pN/¿N. This resu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822394

28. Calibration of Piezoresistive Cantilever Force Sensors Using the NIST Electrostatic Force Balance
Published: 11/16/2003
Authors: Jon Robert Pratt, David B Newell, John A Kramar, Eric Paul Whitenton
Abstract: The characterization of material properties and mechanical performance of micro-electromechanical devices often hinges on the accurate measurement of small forces.  Calibrated load cells of appropriate size and range are used, but are often not ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823316

29. Dependency of Morphology on Miscut Angle for Si(111) Etched in NH^d4^F
Published: 5/1/2003
Authors: Joseph Fu, Hui Zhou, John A Kramar, Richard M Silver, S Gonda
Abstract: Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH^d4^F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the numbe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823151

30. Dependence of Morphology on Miscut Angle for Si(111) Etched in NH(4)F
Published: 5/1/2003
Authors: S Gonda, Joseph Fu, John A Kramar, Richard M Silver, Hui Zhou
Abstract: Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH(4)F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the number ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822425



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