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Author: william guthrie

Displaying records 61 to 70 of 76 records.
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61. Extraction of Sheet-Resistance from Four-Terminal Sheet Resistors in Monocrystalline Films Having Non- Planar Geometries
Published: 12/31/1998
Authors: Michael W Cresswell, Nadine Guillaume, Richard A Allen, William F Guthrie, Rathindra Ghoshtagore, James C. OwenI, Z. Osborne, N. Sullivan, Loren W. Linholm
Abstract: This paper describes methods for the extraction of sheet resistance from V/I measurements made on four-terminal sheet resistors incorporated into electrical linewidth test structures patterned with non-planar geometries in monocrystalline silicon-on- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28180

62. Intermittent-Contact Scanning Capacitance Microscopy Imaging and Modeling for Overlay Metrology
Published: 12/31/1998
Authors: Santos D Mayo, Joseph J Kopanski, William F Guthrie
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27867

63. Electrical Linewidth Test Structures Fabricated in Mono-Crystalline Films for Reference-Material Applications
Published: 5/1/1998
Authors: Michael W Cresswell, Richard A Allen, William F Guthrie, Rathindra Ghoshtagore, Loren W. Linholm, J. J. Sniegowski
Abstract: The physical widths of reference features incorporated into electrical linewidth test structures patterned in films of mono-crystalline silicon have been determined from Kelvin voltage measurements. The films in which the test structures are pattern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=18597

64. Electrical Linewidth Test Structures Fabricated in Mono-Crystalline Films for Reference Material Applications
Published: 12/31/1997
Authors: Michael W Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A Allen, William F Guthrie, Loren W. Linholm
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=7227

65. Reference-Length Shortening by Kelvin Voltage in Linewidth Test Structures Replicated in Mono-Crystalline Silicon Films
Published: 12/31/1997
Authors: W. F. Lee, William F Guthrie, Michael W Cresswell, Richard A Allen, J. J. Sniegowski, Loren W. Linholm
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=3491

66. Hybrid Optical-Electrical Overlay Test Structure
Published: 5/1/1997
Authors: Michael W Cresswell, Richard A Allen, Loren W. Linholm, William F Guthrie, William B. Penzes, A. W. Gurnell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23722

67. Hybrid Optical-Electrical Overlay Test Structure
Published: 1/1/1997
Authors: Michael W Cresswell, Robert Allen, L Linholm, William F Guthrie, William B. Penzes, A Gurnell
Abstract: This paper describes the exploratory use of electrical test structures to enable the calibration of optical overlay instruments of the type used to monitor semiconductor-device fabrication processes. Such optical instruments are known to be vulnerabl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820834

68. Hybrid Optical-Electrical Overlay Test Structure
Published: 12/31/1996
Authors: Michael W Cresswell, Richard A Allen, Loren W. Linholm, William F Guthrie, A. W. Gurnell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=7729

69. Recent Developments in Electrical Linewidth and Overlay Metrology for Integrated Circuit Fabrication Processes
Published: 12/31/1996
Authors: Michael W Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A Allen, William F Guthrie, A. W. Gurnell, Loren W. Linholm, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27620

70. A Gravimetric Approach to the Standard Addition Method in Instrumental Analysis 1
Published: Date unknown
Authors: William R. Kelly, Bruce S MacDonald, William F Guthrie
Abstract: A general mathematical formulation for the method of standard additions is presented that has universal applicability. It is based on gravimetry rather than volumetry which reduces the preparation time, gives greater flexibility to design because on ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=832173



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