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You searched on: Author: william guthrie

Displaying records 31 to 40 of 90 records.
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31. Calcium Phosphate Cement With Non-Rigidity and Strength Durability for Periodontal Bone Repair
Published: 8/1/2006
Authors: Hockin D. Xu, Shozo Takagi, Limin Sun, L A Hussain, Laurence Chung Lung Chow, William F Guthrie, James H Yen
Abstract: Background. The need for biomaterials to treat periodontal osseous defects has increased as the world population ages. The objective of the present study was to develop a self-hardening, resorbable, and mech/anically strong calcium phosphate cement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852519

32. Certification of SRM 114q: Part I
Series: Special Publication (NIST SP)
Report Number: 260-161
Published: 6/14/2006
Authors: Chiara F Ferraris, William F Guthrie, A Aviles, Robin K Haupt, Bruce S MacDonald
Abstract: The standard reference material (SRM) for fineness of cement, SRM 114, is an integral part of the calibration material routinely used in the cement industry to qualify cements. Being a powder, the main physical properties of cement, prior to hydratio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=860624

33. Certification of SRM 114q: Part II
Series: Special Publication (NIST SP)
Report Number: 260-166
Published: 6/14/2006
Authors: Chiara F Ferraris, Max A Peltz, William F Guthrie, A Aviles, Robin K Haupt, Bruce S MacDonald
Abstract: The standard reference material (SRM) for fineness of cement, SRM 114, is an integral part of the calibration material routinely used in the cement industry to qualify cements. Being a powder, the main physical properties of cement, prior to hydratio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=860657

34. k=2 and Other Sometimes Hidden Assumptions in Chemical Measurement Uncertainty Intervals
Published: 4/24/2006
Authors: David Lee Duewer, S LR Ellison, William F Guthrie, D B Hibbert, C Jackson, A Kallner, Stefan D Leigh, Reenie May Parris, Kenneth W Pratt, Michele Miller Schantz, Katherine E Sharpless
Abstract: A recent interlaboratory study that required individual analysts to estimate uncertainty intervals for their results revealed that some experienced chemical analysts have difficulty with measurement uncertainty calculations. To help validate assumpti ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=832153

35. Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 3/1/2006
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Michael W. Cresswell, Richard A Allen, William F Guthrie
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology.  There are two major instruments being used for traceable measurements at NIST.  The first is a cus ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823204

36. Nano- and Atomic-Scale Length Metrology
Published: 1/1/2006
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C Feng, Michael W. Cresswell, Richard A Allen, William F Guthrie, Wei Chu
Abstract: We discuss nano-scale length metrology of linewidth, step height, and line edge roughness (LER). These properties are of growing importance to the function and specification of semiconductor devices as the dimensions of semiconductor devices shrink t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823216

37. Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty
Published: 11/30/2005
Authors: Ronald G Dixson, Richard A Allen, William F Guthrie, Michael W. Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32210

38. Critical Dimension Reference Features with Sub-Five Nanometer Uncertainty
Published: 5/30/2005
Authors: Michael W. Cresswell, Ronald G Dixson, William F Guthrie, Richard A Allen, Christine E. Murabito, Brandon Park, Joaquin (Jack) Martinez, Amy Hunt
Abstract: The implementation of a new type of HRTEM-imaging (High-Resolution Transmission Electron Microscopy) test structure, and the use of CD-AFM (CD-Atomic Force Microscopy) to serve as the transfer metrology have resulted in reductions in the uncertaintie ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31923

39. Comparison of SEM and HRTEM CD-Measurements Extracted from Monocrystalline Tes-Structures Having Feature Linewidths from 40 nm to 240 nm
Published: 4/18/2005
Authors: Michael W. Cresswell, Brandon Park, Richard A Allen, William F Guthrie, Ronald G Dixson, Wei Tan, Christine E. Murabito
Abstract: CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to faci ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31907

40. Extraction of Critical Dimension Reference Feature CDs from New Test Structure Using HRTEM Imaging
Published: 4/18/2005
Authors: Richard A Allen, Amy Hunt, Christine E. Murabito, Brandon Park, William F Guthrie, Michael W. Cresswell
Abstract: NIST has an ongoing effort to provide the semiconductor industry with critical dimension CD reference materials, using the silicon (111) lattice spacing as a reference to establish the linewidth. Recent developments include both a new test structure ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31924



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  • SP 250-XX: Calibration Services
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