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You searched on: Author: william guthrie

Displaying records 31 to 40 of 82 records.
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31. Comparison of SEM and HRTEM CD-Measurements Extracted from Monocrystalline Tes-Structures Having Feature Linewidths from 40 nm to 240 nm
Published: 4/18/2005
Authors: Michael W Cresswell, Brandon Park, Richard A Allen, William F Guthrie, Ronald G Dixson, Wei Tan, Christine E. Murabito
Abstract: CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to faci ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31907

32. Extraction of Critical Dimension Reference Feature CDs from New Test Structure Using HRTEM Imaging
Published: 4/18/2005
Authors: Richard A Allen, Amy Hunt, Christine E. Murabito, Brandon Park, William F Guthrie, Michael W Cresswell
Abstract: NIST has an ongoing effort to provide the semiconductor industry with critical dimension CD reference materials, using the silicon (111) lattice spacing as a reference to establish the linewidth. Recent developments include both a new test structure ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31924

33. Comparison of SEM and HRTEM CD-Measurements Extracted From Monocrystalline Tes-Structures Having Feature Linewidths From 40 nm to 240 nm
Published: 4/4/2005
Authors: W Tan, Robert Allen, Michael W Cresswell, Christine E. Murabito, B C. Park, Ronald G Dixson, William F Guthrie
Abstract: CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to faci ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822390

34. Report of Investigation of RM 8111: Single-Crystal Critical Dimension Prototype Reference Materials
Published: 3/2/2005
Authors: Michael W Cresswell, Richard A Allen, Ronald G Dixson, William F Guthrie, Christine E. Murabito, Brandon Park, Joaquin (Jack) Martinez
Abstract: Staff of the Semiconductor Electronics Division, the Information Technology Laboratory, and the Precision Engineering Laboratory at NIST, in collaboration with VLSI Standards, Inc., of San Jose, California, have developed a new generation of prototyp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31868

35. Troubleshooting Key Comparisons (A Survey of Design, Analysis, and Reporting of Results in Key Comparisons)
Published: 3/1/2005
Authors: Adriana Hornikova, William F Guthrie
Abstract: Key comparisons are international interlaboratory studies used to establish the degree of equivalence between national measurement standards. These studies, carried out by National Metrology Institutes, aer time-consuming, but necessary to facilitate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151798

36. CD-AFM Reference Metrology at NIST and SEMATECH
Published: 2/27/2005
Authors: Ronald G Dixson, Jing Fu, Ndubuisi G Orji, William F Guthrie, Richard A Allen, Michael W Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32108

37. A Survey of Key Comparisons
Published: 1/1/2005
Authors: Adriana Hornikova, William F Guthrie
Abstract: Key Comparisons are international inter-laboratory studies used to establish the degree of equivalence between national measurement standards. These studies, carried out by National Metrology Institutes, are time-consuming, but necessary to facilita ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=150364

38. Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty
Published: 1/1/2005
Authors: Ronald G Dixson, Richard A Allen, William F Guthrie, Michael W Cresswell
Abstract: The use of critical dimension atomic force microscopes (CD-AFMs) in semiconductor manufacturing, both for process control and as a reference metrology tool, is increasing.  If the tip width is calibrated consistentlybetween measurements, a CD-AF ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823193

39. Troubleshooting Key Comparisons
Published: 12/1/2004
Authors: Adriana Hornikova, William F Guthrie
Abstract: Key Comparisons are international inter-laboratory studies used to establish the degree of equivalence between national measurement standards. These studies, carried out by National Measurement Institutes, are time-consuming, but necessary to facili ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50365

40. The NIST 3 Megawatt Quantitative Heat Release Rate Facility - Description and Procedures
Series: NIST Interagency/Internal Report (NISTIR)
Published: 9/1/2004
Authors: Rodney A Bryant, Thomas J. Ohlemiller, Erik L Johnsson, Anthony P Hamins, B S Grove, William F Guthrie, Alexander Maranghides, George William Mulholland
Abstract: The 3 Megawatt Heat Release Rate Facility was developed at NIST as a first step toward having broad capabilities for making quantitative large scale fire measurements. Such capabilities will be used at NIST to validate fire models and to develop sub ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=861322



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