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1. High throughput measurements of thermochromic behavior in V_{1-x}Nb_xO_2 combinatorial thin film libraries
Published: 9/2/2014
Authors: Sara Cordero Barron, Justin M Gorham, Martin L Green, Mitul P. Patel
Abstract: We describe the high-throughput characterization of near infrared thermochromism in V1-xNbxO2 combinatorial thin film libraries. The oxide thin film libraries are prepared with a VO2 crystal structure and a continuous gradient in composition from imp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915214

2. Thermochromic Phase Transitions in VO2-based Thin Films for Energy-Saving Applications
Published: 5/14/2014
Authors: Sara Cordero Barron, Justin M Gorham, Martin L Green
Abstract: The thermochromic transition in vanadium dioxide has potential application as a smart energy-saving window coating, but the temperature of the transition must be depressed from 68°C to Earth ambient temperatures by the incorporation of transition met ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915450

3. Development of a Seebeck Coefficient Standard Reference Material (SRM),
Published: 8/1/2011
Authors: Nathan Lowhorn, Winnie K Wong-Ng, John Lu, Joshua Brooks Martin, Martin L Green, John E Bonevich, Evan L. Thomas, Neil Dilley, Jeff Sharp
Abstract: We have successfully developed a Seebeck coefficient Standard Reference Material (SRM,), Bi2Te3, that is essential for interlaboratory data comparison and for instrument calibration. Certification measurements were performed using a differential stea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907792

4. Manipulation of crystallinity boundary via process space investigations of pulsed laser deposited high-k HfO2-TiO2-Y2O3 combinatorial thin films
Published: 3/10/2010
Authors: Jennifer L Klamo, Peter K. Schenck, Peter G. Burke, Kao-Shuo Chang, Martin L Green
Abstract: Combinatorial library films of HfO2-TiO2-Y2O3, a high-k dielectric system, grown by pulsed laser deposition, exhibit visible boundary lines separating amorphous and crystalline phases. By changing processing space parameters, specifically substrate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854456

5. RECENT INVESTIGATIONS OF Sr-Ca-Co-O THERMOELECTRIC MATERIALS
Published: 12/21/2009
Authors: Winnie K Wong-Ng, Guangyao Liu, Makoto Otani, Evan L. Thomas, Nathan Lowhorn, Martin L Green, James A. Kaduk
Abstract: Three low-dimension cobaltites in the Sr-Ca-Co-O system have been studied for their structure and thermoelectric properties. Using x-ray pole figure construction technique, a Ca3Co4O9 thin film showed excellent fiber texture but no ab in-plane textur ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901376

6. Measurement of heat capacity and enthalpy of formation of Nickel Silicide using Nano-calorimetry
Published: 11/2/2009
Authors: Ravi Kummamuru, Lito De La Rama, Liang Hu, Mark D Vaudin, Mikhail Efremov, Martin L Green, David A LaVan, Leslie Allen
Abstract: We present characterization of energetics of the reaction between nickel and silicon thin films using differential scanning nano-calorimetry (nano-DSC). For the first time, nano-DSC measurements up to 850 °C and of enthalpy of thin film reactions hav ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902298

7. Development of a Seebeck Coefficient Standard Reference Material
Published: 8/7/2009
Authors: Nathan Lowhorn, Winnie K Wong-Ng, John Lu, Evan L. Thomas, Makoto Otani, Martin L Green, Neil Dilley, Jeffrey Sharp, Thanh N. Tran
Abstract: We have successfully developed a Seebeck coefficient Standard Reference Material (SRM ), Bi2Te3, that is crucial for interlaboratory data comparison and for instrument calibration. Certification measurements were performed using two different techniq ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854458

8. Annealing Behavior of Atomic Layer Deposited HfO2 Films Studied by Synchrotron X-Ray Reflectivity and Grazing Incidence Small Angle Scattering
Published: 6/30/2009
Authors: Martin L Green, Andrew John Allen, J. L. Jordan-Sweet, Jan Ilavsky
Abstract: New results are presented for the annealing behavior of ultrathin complementary-metal-gate-semiconductor (CMOS) gate-dielectric (high-) HfO2 films grown by atomic layer deposition (ALD). A series of ALD HfO2 dielectric films has been stu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854475

9. Thermoelectric and Structural Characterization of Ba2Ho(Cu3-xCox)O6+y
Published: 6/13/2009
Authors: Winnie K Wong-Ng, Z Yang, Y F Hu, Qingzhen Huang, Nathan Lowhorn, Makoto Otani, James A Kaduk, Martin L Green, Q Li
Abstract: The search for thermoelectric materials for power generation and for solid-state cooling have led to the increased interest of layered cobalt-containing oxides because of their thermal stability at high temperature and their desirable thermoelectric ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851090

10. A High-throughput Screening System for Thermoelectric Material Exploration Based on Combinatorial Film Approach
Published: 5/7/2009
Authors: Makoto Otani, Evan L. Thomas, Winnie K Wong-Ng, Peter K. Schenck, Nathan Lowhorn, Martin L Green, Hiroyuki Ohguchi
Abstract: A high-throughput system that consists of a combinatorial tool (a sputtering deposition tool and a pulsed laser deposition tool) and two property screening devices, developed at NIST, was used for thermoelectric material exploration. The thermoelectr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854167



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