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Author: thomas germer

Displaying records 31 to 40 of 159 records.
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31. Modeling the Effect of Finite Size Gratings on Scatterometry Measurements
Published: 2/25/2008
Authors: Elizabeth Kenyon, Michael W Cresswell, Heather J Patrick, Thomas Avery Germer
Abstract: The interpretation of scatterometry measurements generally assumes that the grating extends over an area large enough to intercept all the illumination provided by an incident beam.  However, in practice, the grat-ings used in scatterometry are ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32956

32. Optical Critical Dimension Measurement of Silicon Grating Targets Using Back Focal Plane Scatterfield Microscopy
Published: 1/2/2008
Authors: Heather J Patrick, Ravikiran (Ravikiran) Attota, Bryan M Barnes, Thomas Avery Germer, Michael T. Stocker, Richard M Silver, Michael R Bishop
Abstract: We demonstrate optical critical dimension measurement of lines in silicon grating targets using back focal plane scatterfield microscopy. In this technique, angle-resolved diffraction signatures are obtained from grating targets by imaging the back ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841060

33. Improved Method for Calibrating a Stokes Polarimeter
Published: 12/10/2007
Authors: Bruno Boulbry, J C Ramella-Roman, Thomas Avery Germer
Abstract: We present a method for calibrating polarimeters that uses a set of well-characterized reference polarizations and makes no assumptions about the optics contained in the polarimeter other than their linearity. The method requires that a matrix be co ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841092

34. Progress Towards Traceable Nanoscale Optical Critical Dimension Metrology for Semiconductors
Published: 10/1/2007
Authors: Heather J Patrick, Thomas Avery Germer
Abstract: Non-imaging optical critical dimension (OCD) techniques have rapidly become a preferred method for measuring nanoscale features in semiconductors. OCD relies upon the measurement of an optical reflectance signature from a grating target as a function ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841133

35. Truncated Singular Value Decomposition Method for Calibrating a Stokes Polarimeter
Published: 10/1/2007
Authors: Bruno Boulbry, J C Ramella-Roman, Thomas Avery Germer
Abstract: We present a method for calibrating polarimeters that uses a set of well-characterized reference polarizations and makes no assumptions about the optics contained in the polarimeter other than their linearity. The method requires that a matrix be co ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841119

36. Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications
Published: 9/30/2007
Authors: Heather Patrick, Thomas Avery Germer, Michael W Cresswell, Richard A Allen, Ronald G Dixson, Michael Bishop
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32756

37. Relaxation Behavior of Polymer Structures Fabricated by Nanoimprint Lithography
Published: 8/14/2007
Authors: Yifu Ding, Hyun W. Ro, Thomas Avery Germer, Jack F Douglas, Brian C. Okerberg, Alamgir Karim, Christopher Soles
Abstract: We study the decay of the imprinted polystyrene (PS) patterns under thermal annealing using light diffraction. The first order diffraction intensity from the imprinted gratings was measured as a function of annealing time. Local intensity maximum i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852744

38. Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications
Published: 5/7/2007
Authors: Heather J Patrick, Thomas Avery Germer, Michael W Cresswell, Richard A Allen, Ronald G Dixson, Michael R Bishop
Abstract: We use an optical critical dimension technique, matching modeled to measured scatterometry signatures, to obtain critical dimension linewidth on grating targets fabricated using the single-crystal critical dimension reference materials process. The ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841085

39. Modeling the Effect of Line Profile Variation on Optical Critical Dimension Metrology
Published: 5/7/2007
Author: Thomas Avery Germer
Abstract: We investigate the effects that variations in profile have on specular and diffuse reflectance from a grating consisting of parallel lines. We investigate, as an example, a nominal grating consisting of 100 nm photoresist or silicon lines on a silic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841071

40. Study of Test Structures for Use as Reference Material in Optical Critical Dimension Applications
Published: 3/22/2007
Authors: Richard A Allen, Heather Patrick, Michael Bishop, Thomas Avery Germer, Ronald G Dixson, William Gutherie, Michael W Cresswell
Abstract: Optical critical dimension (OCD) metrology has rapidly become an important technology in supporting the worldwide semiconductor industry. OCD relies on a combination of measurement and modeling to extract the average dimensions of an array of identic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32593



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