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You searched on: Author: thomas germer

Displaying records 31 to 40 of 165 records.
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31. Effect of Line Width Roughness on Optical Scatterometry Measurements
Published: 4/6/2009
Authors: Brent C. Bergner, Thomas Avery Germer, Thomas Suleski
Abstract: Line width roughness (LWR) has been identified as a potential source of uncertainty in scatterometry measurements, and characterizing its effect is required to improve the method s accuracy and to make measurements traceable. In this work, we extend ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901895

32. Circular Polarization in Scattered Light as a Possible Biomarker
Published: 3/2/2009
Authors: Thomas Avery Germer, William Sparks, James H. Hough, Ludmilla Kolokolova, Feng Chen, Shiladitya DasSarma, Priya DasSarma, Frank Robb, Nadine Manset, Neill Reid, F. D. Macchetto, William Martin
Abstract: Biological molecules exhibit homochirality and are optically active. Therefore, it is possible that the scattering of light by biological molecules might result in a macroscopic signature in the form of circular polarization. If this is the case, the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901371

33. In situ measurement of annealing-induced line shape decay in nanoimprinted polymers using scatterometry
Published: 3/2/2009
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun Wook Ro, Lee J Richter, Christopher L Soles
Abstract: Thermal embossing nanoimprint lithography (NIL) is an area of continuing interest because it allows direct patterning of nanoscale structures into a wide variety of functional polymer materials. Measuring the shape evolution of nanoimprinted lines d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901568

34. Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers
Published: 12/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun Wook Ro, Lee J Richter, Christopher L Soles
Abstract: We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900878

35. Modeling the Effect of Finite Size Gratings on Scatterometry Measurements
Published: 9/1/2008
Authors: Elizabeth Kenyon, Michael W. Cresswell, Heather J Patrick, Thomas Avery Germer
Abstract: The interpretation of scatterometry measurements generally assumes that the grating extends over an area large enough to intercept all the illumination provided by an incident beam. However, in practice, the gratings used in scatterometry are relati ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842444

36. Extraction of trench geometry and linewidth of nanoscale grating targets in (110)-oriented silicon using angle-resolved scatterometry
Published: 6/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Michael W. Cresswell, Bin Li, Huai Huang, Paul S. Ho
Abstract: The extraction of nanoscale dimensions and feature geometry of grating targets using signature-based optical techniques is an area of continued interest in semiconductor manufacturing. In the current work, we have performed angle-resolved scatterome ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842548

37. Modeling the Effect of Finite Size Gratings on Scatterometry Measurements
Published: 2/25/2008
Authors: Elizabeth Kenyon, Michael W. Cresswell, Heather J Patrick, Thomas Avery Germer
Abstract: The interpretation of scatterometry measurements generally assumes that the grating extends over an area large enough to intercept all the illumination provided by an incident beam.  However, in practice, the grat-ings used in scatterometry are ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32956

38. Optical Critical Dimension Measurement of Silicon Grating Targets Using Back Focal Plane Scatterfield Microscopy
Published: 1/2/2008
Authors: Heather J Patrick, Ravikiran Attota, Bryan M Barnes, Thomas Avery Germer, Michael T. Stocker, Richard M Silver, Michael R Bishop
Abstract: We demonstrate optical critical dimension measurement of lines in silicon grating targets using back focal plane scatterfield microscopy. In this technique, angle-resolved diffraction signatures are obtained from grating targets by imaging the back ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841060

39. Improved Method for Calibrating a Stokes Polarimeter
Published: 12/10/2007
Authors: Bruno Boulbry, J C Ramella-Roman, Thomas Avery Germer
Abstract: We present a method for calibrating polarimeters that uses a set of well-characterized reference polarizations and makes no assumptions about the optics contained in the polarimeter other than their linearity. The method requires that a matrix be co ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841092

40. Progress Towards Traceable Nanoscale Optical Critical Dimension Metrology for Semiconductors
Published: 10/1/2007
Authors: Heather J Patrick, Thomas Avery Germer
Abstract: Non-imaging optical critical dimension (OCD) techniques have rapidly become a preferred method for measuring nanoscale features in semiconductors. OCD relies upon the measurement of an optical reflectance signature from a grating target as a function ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841133



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