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Author: joseph fu

Displaying records 41 to 50 of 72 records.
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41. Calibration of High-Resolution X-Ray Tomography With Atomic Force Microscopy
Series: Journal of Research (NIST JRES)
Published: 11/1/2000
Authors: A R Kalukin, B Winn, S S Wang, C Jacobsen, Zachary H Levine, Joseph Fu
Abstract: For two-dimensional x-ray imaging of thin films, the technique of scanning transmission x-ray miscroscopy (STXM) has achieved images with feature sizes as small as 40 nm in recent years. However, calibration of three-dimensional tomographic images t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840060

42. Calibration of High-Resolution X-Ray Tomography with Atomic Force Microscopy
Published: 11/1/2000
Authors: A Kalukin, B Winn, Yong Wang, C Jacobsen, Z Levine, Joseph Fu
Abstract: For two-dimensional x-ray imaging of thin films, the technique of scanning transmission x-ray microscopy (STXM) has achieved images with feature sizes as small as 40 nm in recent years. However, calibration of three-dimensional tomographic images tha ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821587

43. Dimensional Metrology of Millimeter- and Sub-millimeter-scale Components
Published: 10/1/2000
Authors: Theodore Vincent Vorburger, Jun-Feng Song, Joseph Fu, M Tundermann, Thomas B Renegar, Theodore D Doiron, N G Orji
Abstract: Decreasing sizes and tolerances of engineering components bring a demand for decreasing uncertainty in the dimensional measurements of these parts. Hence there is increasing need for measuring machines capable of performing dimensional and geometrica ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820999

44. Accurate Dimensional Metrology With Atomic Force Microscopy
Published: 6/1/2000
Authors: Ronald G Dixson, R Koning, Joseph Fu, Theodore Vincent Vorburger, Thomas B Renegar
Abstract: Atomic force microscopes (AFMs) generate three dimensional images with nanometer level resolution and, consequently, are used in the semiconductor industry as tools for sub-micrometer dimensional metrology. Measurements commonly performed with AFMs a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820959

45. Interferometric Calibration of a Capacitance Displacement Sensor Over Short Displacement Ranges
Published: 1/1/2000
Authors: R Koning, Ronald G Dixson, Joseph Fu, G S Peng, Theodore Vincent Vorburger
Abstract: Capacitance displacement sensors, which are widely used to measure and control the true extension of piezoelectric actuators, have to be calibrated, if they are to be used for measurement purposes. We have investigated the calibration of a capacitanc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820964

46. The Role of Periodic Interferometer Errors in the Calibration of Capacitance Displacement Sensors for Nanometrology Applications
Published: 1/1/2000
Authors: R Koning, Ronald G Dixson, Joseph Fu, Theodore Vincent Vorburger
Abstract: Although the role of the periodic errors of optical heterodyne interferometers in displacement measurements is fairly well understood, their influence on the calibration of other types of displacement sensors do not seem to be studied as extensively. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820965

47. Step Height Metrology for Data Storage Applications
Published: 11/1/1999
Authors: R Koning, Ronald G Dixson, Joseph Fu, Thomas B Renegar, Theodore Vincent Vorburger, V W. Tsai, Michael T Postek
Abstract: The measurements of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) are quite different from the measurement of step heights on step height calibration standards.  Both the bumps and the pits show much large ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823118

48. Step-height Metrology for Data Storage Applications
Published: 11/1/1999
Authors: R Koning, Ronald G Dixson, Joseph Fu, Thomas B Renegar, Theodore Vincent Vorburger, V W. Tsai, Michael T Postek
Abstract: The measurement of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) is quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820931

49. Dimensional Metrology with the NIST Calibrated Atomic Force Microscope
Published: 6/1/1999
Authors: Ronald G Dixson, R Koning, V W. Tsai, Joseph Fu, Theodore Vincent Vorburger
Abstract: Atomic force microscopes (AFMs) are increasingly used in the semiconductor industry as tools for submicrometer dimensional metrology. The scales of an AFM must be calibrated in order to perform accurate measurements. We have designed and developed th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820926

50. Algorithms for Calculating Single-Atom Step Heights
Published: 1/1/1999
Authors: Joseph Fu, V W. Tsai, R Koning, Ronald G Dixson, Theodore Vincent Vorburger
Abstract: Recently, measuring Si(111) single atomic steps prompted us to investigate the measuring technique. The section technique is the most popular method for measuring the height. By measuring a simulated Si(111) atomic step, we have found it could have a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820930



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