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You searched on: Author: john dagata

Displaying records 31 to 40 of 66 records.
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31. Metal-based Room-temperature Operating Single Electron Devices Using Scanning Probe Oxidation
Published: 1/30/1998
Authors: K Matsumoto, Y Gotoh, T Maeda, John A Dagata, J S Harris
Abstract: Coulomb oscillation was clearly observed at room temperature in the single electron transistor fabricated by atomic force microscopy (AFM) nano-oxidation process. In order to obtain a clear Coulomb oscillation at room temperature, new and improved fa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821784

32. Characterization of Surface Topography
Published: 1/1/1998
Authors: Theodore Vincent Vorburger, John A Dagata, G. Wilkening, K Iizuka
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901983

33. Electronic Properties of GaAs Surfaces Etched in an Electron Cyclotron Resonance Source and Chemically Passivated Using P2S5
Published: 1/1/1998
Authors: O Glembocki, J Tuchman, John A Dagata, K Ko, S Pang, C Stutz
Abstract: Photoreflectance has been used to study the electronic properties of (100) GaAs surfaces exposed to a Cl2/Ar plasma generated by an electron cyclotron resonance source and subsequently passivated by P2S5. The plasma etch shifts the Fermi level of p-G ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821782

34. The Role of Space Charge in Scanned Probe Oxidation
Published: 1/1/1998
Author: John A Dagata
Abstract: The growth rate and electrical character of nanostructures produced by scanned probe oxidation are investigated by integrating an in-situ electrical force characterization technique, scanning Maxwell-stress microscopy, into the fabrication process. S ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820888

35. Understanding Scanned Probe Oxidation of Silicon
Published: 1/1/1998
Authors: John A Dagata, T Inoue, J Itoh, H Yokoyama
Abstract: A model for scanned probe microscope (SPM) silicon oxidation is presented. The model was derived from a consideration of the space-charge dependence of this solid-state reaction as a function of substrate doping type/level and has been verified exper ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821775

36. Voltage Modulation Scanned Probe Oxidation (Abstract)
Published: 1/1/1998
Authors: John A Dagata, T Inoue, J Itoh, K Matsumoto, H Yokoyama
Abstract: This talk describes methods for enhancing the growth rate and electrical characteristics of nanostructures produced on silicon and titanium substrates by scanned probe microscope (SPM) oxidation. Direct oxidation of a substrate by the intense electr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823101

37. Applications of the Rapidly Renewable Lap
Published: 11/1/1997
Authors: R E. Parks, E Robert, Christopher J. Evans, David J Roderick, J David, John A Dagata
Abstract: The rapidly renewable lap is based on the simple concept of generating the figure needed in a lap substrate and then replicating it into a thin film slumped over the substrate. Based on this concept, we describe how efficient laps can be constructed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821593

38. Evaluation of Scanning Maxwell-Stress Microscopy for SPM-Based Nanoelectronics
Published: 9/1/1997
Author: John A Dagata
Abstract: A preliminary evaluation of the compatibility, spatial resolution, and sensitivity of scanning Maxwell-stress microscopy (SMM) as an in situ diagnostic technique for SPM oxidation of silicon is presented. These results indicate that SMM will provide ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820835

39. Industrial Uses of STM and AFM
Published: 1/1/1997
Authors: Theodore Vincent Vorburger, John A Dagata, G. Wilkening, K Iizuka
Abstract: We review the field of STM and AFM as applied to industrial problems, and we classify the applications into four classes: research with potential benefit to industry, research performed by industry, applications off-line in manufacturing, and applica ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820882

40. Workshop Discussion: A Framework for Standards Development and the Future of the IASPM Workshops
Published: 1/1/1997
Author: John A Dagata
Abstract: A proposal to develop the Industrial Applications of Scanned Probe Microscopy (IASPM) workshops, which NIST has co-sponsored with Sematech, the ASTM E42.14 subcommittee, and the American Vacuum Society, over the past four years into a forum for assis ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820836



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