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Author: bryan barnes
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31. Fundamental Limits of Optical Critical Dimension Metrology: A Simulation Study
Richard M Silver, Thomas Avery Germer, Ravikiran Attota, Bryan M Barnes, B Bunday, J Allgair, Egon Marx, Jay Shi Jun
This paper is a comprehensive summary and analysis of a SEMATECH funded project to study the limits of optical critical dimension scatterometry. The project was focused on two primary elements: 1) the comparison, stability, and validity of indu ...
32. Illumination Optimization for Optical Semiconductor Metrology
Bryan M Barnes, L Howard, Richard M Silver
Uniform sample illumination via K hler illumination, is achieved by establishing a pair of conjugate focal planes; a light source is focused onto the condenser lens aperture while the image of the field aperture is focused at the plane of the specime ...
33. Koehler Illumination for High-Resolution Optical Metrology
Martin Y Sohn, Bryan M Barnes, Lowell P. Howard, Richard M Silver, Ravikiran Attota, Michael T. Stocker
Accurate preparation of illumination is critical for high-resolution optical metrology applications such as line width and overlay measurements. To improve the detailed evaluation and alignment of the illumination optics, we have separated Koehler il ...
34. The Limits of Image-Based Optical Metrology
Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, James J Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J Patrick, Ronald G Dixson, Robert D. Larrabee
An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper. We have developed a set of techniques we refer to as scatterfield microscopy ...