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You searched on: Author: ravikiran attota Sorted by: date

Displaying records 1 to 10 of 46 records.
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1. Parameter optimization for through-focus scanning optical microscopy
Published: 6/23/2016
Authors: Ravikiran Attota, Hyeong G. Kang
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=920557

2. Optimizing noise for defect analysis with through-focus scanning optical microscopy
Published: 3/25/2016
Authors: Ravikiran Attota, John A Kramar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=920308

3. Noise analysis for through-focus scanning optical microscopy method
Published: 2/3/2016
Author: Ravikiran Attota
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919393

4. A method to determine the number of nanoparticles in a cluster using conventional optical microscopes
Published: 9/10/2015
Authors: Hyeong G. Kang, Ravikiran Attota, Premsagar Purushotham Kavuri, Vipin Nagnath Tondare, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918715

5. Nanoparticle size determination using optical microscopes
Published: 10/27/2014
Authors: Ravikiran Attota, Richard J Kasica, Premsagar Purushotham Kavuri, Hyeong G. Kang, Lei Chen
Abstract: We present a simple method for size determination of nanoparticles using conventional optical microscopes. The method, called through-focus scanning optical microscopy (TSOM), makes use of the four-dimensional optical information collected at differe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914209

6. Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes
Published: 7/29/2014
Authors: Ravikiran Attota, Ronald G Dixson
Abstract: We experimentally demonstrate that the three-dimensional (3-D) shape variations of nanometer-scale objects can be resolved and measured with sub-nanometer scale sensitivity using conventional optical microscopes by analyzing 3-D optical data using th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908543

7. Through-focus scanning optical microscopy for defect inspection of EUV masks
Published: 8/12/2013
Authors: Ravikiran Attota, Vibhu Jindal
Abstract: The TSOM method provides three-dimensional nanoscale metrology using a conventional optical microscope. Substantial improvements in defect detectability using the TSOM method will be presented. The TSOM method shows potential to (i) detect phase defe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914027

8. Critical dimension metrology by through-focus scanning optical microscopy beyond the 22 nm node
Published: 6/7/2013
Authors: Ravikiran Attota, Benjamin D. Bunday, Victor Vertanian
Abstract: We present results using simulations and experiments to demonstrate metrological applications of the through-focus scanning optical microscopy (TSOM) down to features at and well below the International Technology Roadmap for Semiconductors' 22  ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913353

9. TSV Reveal height and bump dimension metrology by the TSOM method
Published: 4/30/2013
Authors: Ravikiran Attota, Haesung Park, Victor H Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667

10. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913698



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