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Author: ravikiran attota
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1. Through-focus scanning optical microscopy for defect inspection of EUV masks
Published: 8/12/2013
Authors: Ravikiran Attota, Vibhu Jindal
Abstract: The TSOM method provides three-dimensional nanoscale metrology using a conventional optical microscope. Substantial improvements in defect detectability using the TSOM method will be presented. The TSOM method shows potential to (i) detect phase defe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914027

2. Critical dimension metrology by through-focus scanning optical microscopy beyond the 22 nm node
Published: 6/7/2013
Authors: Ravikiran Attota, Benjamin D. Bunday, Victor Vertanian
Abstract: We present results using simulations and experiments to demonstrate metrological applications of the through-focus scanning optical microscopy (TSOM) down to features at and well below the International Technology Roadmap for Semiconductors' 22  ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913353

3. TSV Reveal height and bump dimension metrology by the TSOM method
Published: 4/30/2013
Authors: Ravikiran Attota, Haesung Park, Victor Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667

4. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913698

5. Nanoparticle Size and Shape Evaluation Using the TSOM Method
Published: 6/1/2012
Authors: Bradley N Damazo, Ravikiran Attota, Premsagar Purushotham Kavuri, Andras Vladar
Abstract: A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911138

6. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Published: 4/10/2012
Authors: Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

7. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

8. Optical microscope angular illumination analysis
Published: 3/7/2012
Author: Ravikiran Attota
Abstract: For high precision applications of optical microscopes, it is critical to achieve symmetrical angular illumination intensity at the sample plane, in addition to uniform spatial intensity achieved by Köhler illumination. In this paper, first we dem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910145

9. Through-focus Scanning Optical Microscopy
Published: 12/31/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) method provides three-dimensional information (i.e. the size, shape and location) about micro- and nanometer-scale structures. TSOM, based on a conventional optical microscope, achieves this by acquiri ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908493

10. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395



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