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Sushil K Satija (Fed)

Publications

Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography

Author(s)
D M. Goldfarb, Eric K. Lin, Christopher Soles, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Wilson, Sushil K. Satija, Wen-Li Wu
State-of-the-art lithographic technologies combine chemically amplified photoresists and sophisticated radiation sources to delineate patterned areas with high

Effect of Molecular Weight and Layer Thickness on the Dielectric Breakdown Strength of Neat and Homopolymer Swollen Lamellar Block Copolymer Films

Author(s)
Saumil Samant, Monali Basutkar, Maninderjeet Singh, Ali Masud, Christopher A. Grabowski, Kim Kisslinger, Joseph Strzalka, Guangcui Yuan, Sushil K. Satija, Ikeoluwa Apata, Dharmaraj Raghavan, Michael Durstock, Alamgir Karim
Designing next generation light-weight pulsed power sources hinges on understanding the factors influencing the performance of high energy density storage
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Created October 9, 2019, Updated December 8, 2022