NIST logo

Publication Citation: Monte Carlo Modeling of Secondary Electron Imaging in Three Dimensions

NIST Authors in Bold

Author(s): John S. Villarrubia; Nicholas W. Ritchie; J R. Lowney;
Title: Monte Carlo Modeling of Secondary Electron Imaging in Three Dimensions
Published: March 01, 2007
Abstract:
Conference: Metrology, Inspection, and Process Control for Microlithography XXI
Proceedings: Proceedings of SPIE, Volume 6518
Volume: 6518
Pages: 14 pp.
Location: San Jose, CA
Dates: February 26-March 1, 2007
Research Areas: Electron microscopy (EM, TEM, SEM, STEM), Modeling
PDF version: PDF Document Click here to retrieve PDF version of paper (532KB)