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|Author(s):||J C. Stover; Sven Schroeder; Thomas A. Germer;|
|Title:||Upper roughness limitations on the TIS/RMS relationship|
|Published:||September 27, 2012|
|Abstract:||The relationship between total integrated scatter (TIS) and root mean square (rms) roughness was developed in the radar literature and enabled the first use of scatter measurements to monitor optical roughness. This relationship has been used and misused ever since. Its most common form makes use of a smooth surface approximation and has been applied to optical surfaces now for half a century. It has been suggested that Davies‰ exponential form can be applied to much rougher surfaces. This paper investigates that issue through a combination of approximate and rigorous calculations made on optically deep sinusoidal gratings and a few measurements.|
|Proceedings:||Reflection, Scattering, and Diffraction from Surfaces III|
|Pages:||pp. 849503-1 - 849503-7|
|Location:||San Diego, CA|
|Dates:||August 13-16, 2012|
|Keywords:||roughness, scatter, sinusoidal gratings, total integrated scatter|
|Research Areas:||Optics, Optical Properties of Materials, Optical Scattering|
|DOI:||http://dx.doi.org/10.1117/12.930770 (Note: May link to a non-U.S. Government webpage)|