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Publication Citation: Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates

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Author(s): Joseph L. Tedesco; Walter Zheng; Oleg A. Kirillov; Sujitra J. Pookpanratana; Hyuk-Jae Jang; Premsagar P. Kavuri; Nhan V. Nguyen; Curt A. Richter;
Title: Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates
Published: December 07, 2011
Abstract:
Citation: Proceedings of the IEEE
Keywords: Resistive Switching; Sol-Gel; Thin Films; Flexible Substrates
Research Areas: Nanoelectronics and Nanoscale Electronics, Characterization, Nanometrology, and Nanoscale Measurements