| Author(s): |
Ravikiran Attota; |
| Title: |
Three-dimensional Nanometrology with TSOM Optical Method |
| Published: |
December 10, 2011 |
| Abstract: |
Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry, scanning electron microscopy (SEM), and atomic force microscopy (AFM). TSOM can be used in both reflection and transmission modes and is applicable to a variety of target materials and shapes. Nanometrology applications that have been demonstrated by experiments or simulations include defect analysis, inspection and process control; critical dimension, photomask, overlay, nanoparticle, thin film, and 3D interconnect metrologies; line-edge roughness measurements; and nanoscale movements of parts in MEMS/NEMS. Industries that could benefit include semiconductor, data storage, photonics, biotechnology, and nanomanufacturing. TSOM is relatively simple and inexpensive, has a high throughput, and provides nanoscale sensitivity for 3D measurements with potentially significant savings and yield improvements in manufacturing. |
| Conference: |
An International Conference on PRECISION, MESO, MICRO, AND NANO ENGINEERING |
| Location: |
Pune, -1 |
| Dates: |
December 10-11, 2011 |
| Keywords: |
three-dimensional metrology; TSOM; nanometrology; through-focus; optical microscope |
| Research Areas: |
Measurement Solutions, Optical microscopy, Characterization, Nanometrology, and Nanoscale Measurements |
| PDF version: |
 Click here to retrieve PDF version of paper (731KB) |
