NIST Authors in Bold
| Author(s): | Ronnie R. Fesperman; M A. Donmez; Shawn P. Moylan; |
|---|---|
| Title: | Ultra-Precision Linear Motion Metrology of a Commerically Available Linear Translation Stage |
| Published: | November 18, 2011 |
| Abstract: | Many new compact ultra-precision linear translation stages with exceptionally long ranges of motion on the order of tens of millimeters and positioning resolutions on the order of a nanometer are finding their way into emerging nanotechnologies. This class of positioning system typically has specified linear error motions on the order of a few hundred nanometers or better and angular error motions on the order of 10 arcsec or better. However, measuring and certifying the positioning performance of these new stages with off-the-self instrumentation prescribed by international standards can be very challenging if the test uncertainty ratio is to be greater or equal to 4:1. This paper gives an overview of our effort to extend our measurement capabilities to measure the six error motions of a commercial nanopositioner that has a max travel of 110 mm and a positioning resolution of 1 nm. Test uncertainty ratios of 15:1 to 1.5:1 are achieved. |
| Proceedings: | Proceedings of the 26th Annual Meeting of the American Society for Precision Engineering (ASPE) |
| Pages: | 4 pp. |
| Location: | Denver, CO |
| Dates: | November 13-18, 2011 |
| Keywords: | metrology; linear positioning; straightness; angular deviation; measurement uncertainty |
| Research Areas: | Metrology and Standards for Manufacturing Equipment, Metrology, Manufacturing |
| PDF version: | Click here to retrieve PDF version of paper (174KB) |