Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Thomas A. Germer; Heather J. Patrick; Ronald G. Dixson;|
|Title:||A Traceable Scatterometry Measurement of a Silicon Line Grating|
|Published:||May 26, 2011|
|Abstract:||In this paper, we present a spectroscopic Mueller matrix ellipsometry measurement of a silicon line grating with nominal pitch of 600 nm and line width 100 nm. An uncertainty analysis is performed on the measurement results. The results are compared to critical dimension atomic force microscopy (CD-AFM) measurements. Except for one of the gratings, the CD-AFM and scatterometry measurements lie within each other‰s uncertainties|
|Proceedings:||Frontiers of Characterization and Metrology for Nanoelectronics 2011|
|Pages:||pp. 309 - 313|
|Dates:||May 23-26, 2011|
|Keywords:||ellipsometry, scatterometry, silicon, traceability|
|Research Areas:||Dimensional Metrology, Optical Scattering|
|PDF version:||Click here to retrieve PDF version of paper (141KB)|