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Publication Citation: A Traceable Scatterometry Measurement of a Silicon Line Grating

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Author(s): Thomas A. Germer; Heather J. Patrick; Ronald G. Dixson;
Title: A Traceable Scatterometry Measurement of a Silicon Line Grating
Published: May 26, 2011
Abstract: In this paper, we present a spectroscopic Mueller matrix ellipsometry measurement of a silicon line grating with nominal pitch of 600 nm and line width 100 nm. An uncertainty analysis is performed on the measurement results. The results are compared to critical dimension atomic force microscopy (CD-AFM) measurements. Except for one of the gratings, the CD-AFM and scatterometry measurements lie within each other‰s uncertainties
Proceedings: Frontiers of Characterization and Metrology for Nanoelectronics 2011
Volume: 1395
Pages: pp. 309 - 313
Location: Grenoble, -1
Dates: May 23-26, 2011
Keywords: ellipsometry; scatterometry; silicon; traceability
Research Areas: Dimensional Metrology, Optical Scattering
PDF version: PDF Document Click here to retrieve PDF version of paper (141KB)