NIST logo

Publication Citation: Investigation of SiO2/HfO2 stacks for flash memory applications

NIST Authors in Bold

Author(s): Nhan V. Nguyen; Bashwar Chakrabarti;
Title: Investigation of SiO2/HfO2 stacks for flash memory applications
Published: April 28, 2011
Abstract:
Pages: 30 pp.
Research Areas: Semiconductors, Advanced Materials, Optical Properties of Materials