| Author(s): |
Thomas A. Germer; Martin Foldyna; Brent Bergner; |
| Title: |
Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture |
| Published: |
April 20, 2011 |
| Abstract: |
We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). The unperturbed, reference grating profile was determined from multiple azimuthal configurations using a generalized ellipsometer, focusing the incident beam into a 60 µm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture, introducing significant depolarization effects, and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the artificially perturbed grating were then fit using the same model, and the resulting root-mean-square error (RMSE) values for both targets were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER. |
| Proceedings: |
Metrology, Inspection, and Process Control for Microlithography XXV |
| Volume: |
7971 |
| Pages: |
pp. 79710N-1 - 79710N-8 |
| Location: |
San Jose, CA |
| Dates: |
February 28-March 3, 2011 |
| Keywords: |
Finite numerical aperture; line edge roughness; Mueller matrix ellipsometry; periodic grating |
| Research Areas: |
Optical Metrology, Optics |
| PDF version: |
 Click here to retrieve PDF version of paper (645KB) |
