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|Author(s):||Thomas A. Germer; Martin Foldyna; Brent Bergner;|
|Title:||Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture|
|Published:||April 20, 2011|
|Abstract:||We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). The unperturbed, reference grating profile was determined from multiple azimuthal configurations using a generalized ellipsometer, focusing the incident beam into a 60 µm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture, introducing significant depolarization effects, and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the artificially perturbed grating were then fit using the same model, and the resulting root-mean-square error (RMSE) values for both targets were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER.|
|Proceedings:||Metrology, Inspection, and Process Control for Microlithography XXV|
|Pages:||pp. 79710N-1 - 79710N-8|
|Location:||San Jose, CA|
|Dates:||February 28-March 3, 2011|
|Keywords:||Finite numerical aperture, line edge roughness, Mueller matrix ellipsometry, periodic grating|
|Research Areas:||Optical Metrology, Optics|
|PDF version:||Click here to retrieve PDF version of paper (661KB)|