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Publication Citation: Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now

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Author(s): Michael T. Postek; Andras Vladar;
Title: Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now
Published: July 20, 2011
Abstract: A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is discussed through a schematic technology timeline. In addition, a discussion of a future vision for accurate SEM dimensional metrology and the requirements to achieve it are presented.
Citation: Scanning
Volume: 33
Pages: pp. 111 - 125
Keywords: SEM, Monte Carlo modeling, Metrology, Accuracy, Critical Dimensions, Electron-solid interactions
Research Areas: Nanomanufacturing