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|Title:||Surface-directed Growth of Nanowires: A Scalable Platform for Nanodevice Fabrication|
|Published:||July 11, 2011|
|Abstract:||Optical lithography continues to be the popular technique for further miniaturization of electronic circuitry and its components. However, as further device miniaturization continues, complexity of pattern generation and cost increase; therefore the use of such techniques become dominantly specific to high-end applications such as microprocessor manufacturing. As an alternative, nanomaterials and non-conventional nanofabrication methods such as ,bottom-upŠ chemical approaches offer great opportunities in producing useful nanostructure-based devices with potential advantages such as enhanced performance and/or lower cost. Majority of the produced nanomaterials for device applications require post processing ,e.g.Š transfer from a source- to a target substrate. For composite structures this transfer is not a concern, but for producing intricate nanodevices with a large scale hierarchical order, this step becomes a bottleneck as it requires knowledge on surface registries of a large group of nanocrystals on a given surface that is needed for the succeeding fabrication steps.|
|Publisher:||Intech Publishing, Vienna, -1|
|Pages:||pp. 245 - 266|
|Keywords:||Nanowire, nanofabrication, light emitting diode, field-effect transistor, directed growth, nanomaterial, bottom-up chemical approaches|