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|Author(s):||Craig D. McGray; Richard A. Allen; Marc J. Cangemi; Jon C. Geist;|
|Title:||Rectangular Scale-Similar Etch Pits in Monocrystalline Diamond|
|Published:||September 15, 2011|
|Abstract:||Etching of monocrystalline diamond in oxygen and water vapor at 1100° C through small pores in a silicon nitride film produced smooth-walled rectangular cavities. The cavities were imaged by electron microscope and measured by interferometric microscopy. The observed cavities ranged in size from approximately 1 µm up to 72 µm wide, in each case exhibiting smooth, vertical sidewalls, a flat bottom, and a depth equal to half its width. Cavity boundaries were determined to lie along slow-etching (100) crystallographic planes, suggesting the possibility of a powerful class of techniques for high-aspect-ratio bulk micromachining of diamond.|
|Citation:||Diamond and Related Materials|
|Pages:||pp. 1363 - 1365|
|Keywords:||diamond, anisotropic etching, crystallographic etching, oxidation, micromachining, MEMS, nanofabrication|
|Research Areas:||Nanotechnology, Nanofabrication, Nanomanufacturing, and Nanoprocessing|
|PDF version:||Click here to retrieve PDF version of paper (138KB)|