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|Author(s):||Kai Li; Pradeep N. Namboodiri; Sumanth B. Chikkamaranahalli; Gheorghe Stan; Ravikiran Attota; Joseph Fu; Richard M. Silver;|
|Title:||Controlling Formation of Atomic Step Morphology on Micro-patterned Si (100)|
|Published:||August 09, 2011|
|Abstract:||Micro scale features are fabricated on Si (100) surfaces using lithographic techniques and then thermally processed in an ultra high vacuum (UHV) environment. Samples are flash heated at 1200 °C and further annealed at 1050 °C for 18 hours. The surface morphology was examined using an atomic force microscopy (AFM). The process resulted in the formation of symmetric, reproducible step-terrace patterns with very wide atomically flat regions exhibiting highly reproducible step-terrace morphology. 25 µm lithographically patterned cells spontaneously transform into a symmetric formation marked by step bunches pinned by pyramidal structures separated by wide atomic terraces. The pyramidal features are visible using a conventional optical microscope and are to be used as fiducial marks to locate nanoscale features fabricated on the atomically flat terraces.|
|Citation:||Applied Physics Letters|
|Pages:||pp. 041806-1 - 041806-4|
|Keywords:||Silicon (100),Atomic Force Microscopy,Atmic scale Step Morphology|
|Research Areas:||Scanning tunneling microscopy (STM), Surface Physics, Atomic force microscopy (AFM)|
|PDF version:||Click here to retrieve PDF version of paper (599KB)|