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NIST Authors in Bold
|Author(s):||Xiaoxiao Zhu; H Gu; Qiliang Li; Helmut Baumgart; D. E. Ioannou; John S. Suehle; Curt A. Richter;|
|Title:||Application of ALD High-k Dielectric Films as Charge Storage Layer and Blocking Oxide in Nonvolatile Memories|
|Published:||October 06, 2009|
|Research Areas:||Nanoelectronics and Nanoscale Electronics|