Publication Citation
NIST Authors in Bold
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| Author(s): | Xiaoxiao Zhu; H Gu; Qiliang Li; Helmut Baumgart; D. E. Ioannou; John S. Suehle; Curt A. Richter; |
|---|---|
| Title: | Application of ALD High-k Dielectric Films as Charge Storage Layer and Blocking Oxide in Nonvolatile Memories |
| Published: | October 06, 2009 |
| Abstract: | |
| Pages: | 30 pp. |
| Research Areas: | Nanoelectronics and Nanoscale Electronics |