Publication Citation
NIST Authors in Bold
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| Author(s): | Xiaoxiao Zhu; Qiliang Li; D. E. Ioannou; H Gu; Helmut Baumgart; John E. Bonevich; John S. Suehle; Curt A. Richter; |
|---|---|
| Title: | Silicon Nanowire Nonvolatile-Memory with Varying HfO2 Charge Trapping Layer Thickness |
| Published: | December 09, 2009 |
| Abstract: | |
| Pages: | 30 pp. |
| Research Areas: | Nanoelectronics and Nanoscale Electronics |