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|Author(s):||Ronald G. Dixson; Donald Chernoff; Shihua Wang; Theodore V. Vorburger; Siew-Leng Tan; Ndubuisi G. Orji; Joseph Fu;|
|Title:||Multi-laboratory Comparison of Traceable Atomic Force Microscope Measurements of 70 nm Grating Pitch|
|Published:||March 08, 2011|
|Abstract:||The National Institute of Standards and Technology (NIST), Advanced Surface Microscopy (ASM), and the National Metrology Centre (NMC) of the Agency for Science, Technology, and Research (A*STAR) in Singapore have completed a three-way interlaboratory comparison of traceable pitch measurements using atomic force microscopy (AFM). The specimen being used for this comparison is provided by ASM and consists of SiO2 lines having a 70 nm pitch patterned on a silicon substrate. The calibrated atomic force microscope (C-AFM), an AFM with incorporated displacement inteferometry, was used by NIST to participate in this comparison. ASM used a commercially available AFM with an open-loop scanner, calibrated by a 144 nm pitch transfer standard. NMC/A*STAR used a large scanning range metrological atomic force microscope (LRM-AFM) with He-Ne laser displacement interferometry incorporated. All three participants have independently established traceability to the SI (Système International d‰Unités, or International System of Units) meter. The results of this interlaboratory comparison are in agreement within their expanded uncertainties and at the level of a few parts in 10E4|
|Citation:||Journal of Micro/Nanolithography, MEMS, and MOEMS|
|Pages:||pp. 013015-1 - 013015-12|
|Keywords:||AFM, metrology, pitch, standards, calibration, traceability|
|Research Areas:||Instrumentation, Atomic force microscopy (AFM), Measurements|
|PDF version:||Click here to retrieve PDF version of paper (2MB)|