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Publication Citation: Directed 2D-to-3D pattern transfer method for controlled fabrication of topologically complex three- dimensional nanostructures in silicon

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Author(s): Konrad Rykaczewski; Owen J. Hildreth; Ching P. Wong; Andrei G. Fedorov; John H. Scott;
Title: Directed 2D-to-3D pattern transfer method for controlled fabrication of topologically complex three- dimensional nanostructures in silicon
Published: February 01, 2011
Abstract: A process allowing for control over the 3D motion of catalyst nanostructures during Metal-assisted Chemical Etching by their local pinning prior to etching is developed. Topologically complex 3D structures that are partially located within the etched silicon and partially located above the silicon surface can be fabricated repeatedly with high degree of control over the rotation direction and the etch rate.
Citation: Advanced Materials
Volume: 23
Pages: pp. 659 - 663
Keywords: 3D fabrication; FIB; MaCE; Metal-assisted Chemical Etching
Research Areas: Focused ion beam milling (FIB), Direct-write lithography, Directed self-assembly, Etch, Deposition, Nanomaterials
PDF version: PDF Document Click here to retrieve PDF version of paper (465KB)