Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: Generalized ellipsometry of artificially designed line width roughness

NIST Authors in Bold

Author(s): Martin Foldyna; Thomas A. Germer; Brent Bergner; Ronald G. Dixson;
Title: Generalized ellipsometry of artificially designed line width roughness
Published: December 10, 2010
Abstract: We use azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line width roughness (LWR). We model the artificially perturbed grating using 1D and 2D rigorous coupled-wave methods in order to evaluate sensitivity of the experimental spectrally resolved data, measured using a generalized ellipsometer, to the dimensional parameters of LWR. The sensitivity is investigated in the context of multiple conical mounting (azimuth angle) configurations, providing more information about the grating profile.
Citation: Thin Solid Films
Volume: 519
Pages: pp. 2633 - 2636
Keywords: biperiodic gratings, diffraction gratings, ellipsometry, line width roughness, Mueller matrix, multi-azimuth method, RCWA
Research Areas: Optics
PDF version: PDF Document Click here to retrieve PDF version of paper (593KB)