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|Author(s):||Martin Foldyna; Thomas A. Germer; Brent Bergner; Ronald G. Dixson;|
|Title:||Generalized ellipsometry of artificially designed line width roughness|
|Published:||December 10, 2010|
|Abstract:||We use azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line width roughness (LWR). We model the artificially perturbed grating using 1D and 2D rigorous coupled-wave methods in order to evaluate sensitivity of the experimental spectrally resolved data, measured using a generalized ellipsometer, to the dimensional parameters of LWR. The sensitivity is investigated in the context of multiple conical mounting (azimuth angle) configurations, providing more information about the grating profile.|
|Citation:||Thin Solid Films|
|Pages:||pp. 2633 - 2636|
|Keywords:||biperiodic gratings, diffraction gratings, ellipsometry, line width roughness, Mueller matrix, multi-azimuth method, RCWA|
|PDF version:||Click here to retrieve PDF version of paper (593KB)|