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Publication Citation: Plasma Etching Uniformity Control for Making Large and Thick Dual-Focus Zone Plates

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Author(s): Lei Chen; Quandou Wang; Ulf Griesmann;
Title: Plasma Etching Uniformity Control for Making Large and Thick Dual-Focus Zone Plates
Published: January 11, 2011
Abstract: In summary, an optimized plasma etching process has been developed and a Teflon ring has been made to minimize the feature size variation effect and eliminate the thick glass edge effect. Large phase type dual-focus zone plate with good etching profile and better than 2% etching depth uniformity was successfully made, which is acceptable for the error tolerance of the ROC measurement.
Proceedings: 36th International Conference on Micro and Nano Engineering
Location: Genoa, -1
Dates: September 19-22, 2010
Keywords: reactive ion etching, uniformity, zone plate
Research Areas: Etch
PDF version: PDF Document Click here to retrieve PDF version of paper (604KB)