Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Gheorghe Stan; Robert F. Cook;|
|Title:||Advanced Nanoscale Elastic Property Measurement by Contact-Resonance Atomic Force Microscopy|
|Published:||June 23, 2010|
|Abstract:||In atomic force microscopy (AFM)-based techniques, material information (topography, mechanical, electrical, magnetic, etc.) is retrieved from the nanoscale interaction between the AFM tip and the material probed. As the size of the apex of the AFM tip is comparable with the size of the investigated structures, it is very important to recognize the tip contribution to the quantities measured. In particular, this is necessary when nanoscale elastic properties are probed by contact-resonance AFM (CR-AFM), in which case, the tip contribution needs to be considered in both the topographical and contact mechanical responses. By combining topography and mechanical response, an advanced characterization of non-flat nanoscale structures by CR-AFM has been accomplished. Two major applications will be discussed here: (1) self-correlation of the topography image and contact stiffness map for a granular Au film and (2) point measurements across oxidized Si nanowires.|
|Conference:||TechConnect World Conference and Expo 2010|
|Pages:||pp. 1 - 6|
|Dates:||June 21-25, 2010|
|Keywords:||nanoscale elastic modulus, contact resonance, atomic force microscopy, nanowires|
|Research Areas:||Characterization, Nanometrology, and Nanoscale Measurements|