| Author(s): |
Quandou Wang; |
| Title: |
A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate |
| Published: |
June 13, 2010 |
| Abstract: |
A simple method to optimize the etching uniformity when making a Computer generated halogram on a thick optical glass substrate is described, which uses a Teflon ring to enclose the substrate during reactive-ion etching (RIE). |
| Conference: |
Optical Fabrication and Testing 2010 |
| Proceedings: |
OSA Digest Series |
| Pages: |
3 pp. |
| Location: |
Jackson Hole, WY |
| Dates: |
June 13-16, 2010 |
| Keywords: |
CGH; RIE; EDGE; EFFECT |
| Research Areas: |
Optical Metrology |
| PDF version: |
 Click here to retrieve PDF version of paper (139KB) |
