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Publication Citation: A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate

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Author(s): Quandou Wang;
Title: A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate
Published: June 13, 2010
Abstract: A simple method to optimize the etching uniformity when making a Computer generated halogram on a thick optical glass substrate is described, which uses a Teflon ring to enclose the substrate during reactive-ion etching (RIE).
Conference: Optical Fabrication and Testing 2010
Proceedings: OSA Digest Series
Pages: 3 pp.
Location: Jackson Hole, WY
Dates: June 13-16, 2010
Keywords: CGH; RIE; EDGE; EFFECT
Research Areas: Optical Metrology
PDF version: PDF Document Click here to retrieve PDF version of paper (142KB)