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|Author(s):||Michael T. Postek; Andras Vladar; William J. Keery; Michael R. Bishop; Benjamin Bunday; John Allgair;|
|Title:||Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology|
|Published:||July 19, 2010|
|Abstract:||A new multipurpose instrument calibration standard has been released by NIST. This standard was developed to be used primarily for X and Y scale (or magnifi cation) calibrations of scanning electron microscopes from less than 10 times magnification to more than 300 000 times magnification i.e. from about 10 mm to smaller than 300 nm range instrument field of view (FOV). This standard is identifi ed as RM 8820. This is a very versatile standard and it can also be used for calibration and testing of other type of microscopes, such as optical and scanning probe microscopes. Beyond scale calibration, RM 8820 can be used for a number of other applications some of which will be described in this publication.|
|Proceedings:||Proceedings of SPIE Advanced Lithography|
|Pages:||pp. 1B 1 - 1B 11|
|Location:||San Jose, CA|
|Dates:||February 22-24, 2010|
|Keywords:||standards, scanning electron microscope, traceability, magnification, field of view, scale, calibration|
|PDF version:||Click here to retrieve PDF version of paper (4MB)|