Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Bernd Bodermann; D Bergmann; Egbert Buhr; W Haebler-Grohne; Harald Bosse; James E. Potzick; Ronald G. Dixson; Richard Quintanilha; Michael T. Stocker; Andras Vladar; Ndubuisi G. Orji;|
|Title:||Results of an international photomask linewidth comparison of NIST and PTB|
|Published:||October 09, 2009|
|Abstract:||In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution reports on the current status of the bilateral comparison. In particular the methods for linewidth metrology applied at NIST and PTB and its major uncertainty contributions will be discussed based on actual measurements results for both of the mask standards chosen for the bilateral comparison.|
|Conference:||SPIE/BACUS Photomask Technology Conference 2009|
|Proceedings:||SPIE Proceedings Vol. 7488|
|Dates:||September 14-17, 2009|
|Keywords:||linewidth, CD metrology, uncertainty components, Nano1, international comparison, MRA, photomask|
|Research Areas:||Dimensional Metrology|
|PDF version:||Click here to retrieve PDF version of paper (1MB)|