NIST logo

Publication Citation: Results of an international photomask linewidth comparison of NIST and PTB

NIST Authors in Bold

Author(s): Bernd Bodermann; D Bergmann; Egbert Buhr; W Haebler-Grohne; Harald Bosse; James E. Potzick; Ronald G. Dixson; Richard Quintanilha; Michael T. Stocker; Andras Vladar; Ndubuisi G. Orji;
Title: Results of an international photomask linewidth comparison of NIST and PTB
Published: October 09, 2009
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution reports on the current status of the bilateral comparison. In particular the methods for linewidth metrology applied at NIST and PTB and its major uncertainty contributions will be discussed based on actual measurements results for both of the mask standards chosen for the bilateral comparison.
Conference: SPIE/BACUS Photomask Technology Conference 2009
Proceedings: SPIE Proceedings Vol. 7488
Volume: 7488
Pages: 14 pp.
Location: Monterey, CA
Dates: September 14-17, 2009
Keywords: linewidth; CD metrology; uncertainty components; Nano1; international comparison; MRA; photomask
Research Areas: Dimensional Metrology
PDF version: PDF Document Click here to retrieve PDF version of paper (1MB)