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|Author(s):||Ndubuisi G. Orji; Ronald G. Dixson; Aaron Cordes; Benjamin Bunday; John Allgair;|
|Title:||Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment|
|Published:||September 25, 2009|
|Abstract:||A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimensional measurements of nanoscale devices is crucial to the success of nanomanufacturing. There are various strategies for introducing traceability into the nano-manufacturing environment. Some involve first principles realization, but most entail the use of calibrated artifacts. In an environment where different types of products are manufactured, it is challenging to maintain traceability across different products mix. In this paper we present some of the work we have done in developing methods to track the traceability of dimensional measurements performed in a wafer fabrication facility. We combine the concepts of reference measurement system, measurement assurance, and metrological timelines to ensure that traceability is maintained through series of measurements that involve different instruments and products mix, and span over a four years period. We show how to use knowledge of process-induced and instrument systematic errors among others to ensure that the traceability of the measurements is maintained|
|Proceedings:||Proceedings of SPIE Volume 7042 -Instrumentation, Metrology, and Standards for Nanomanufacturing III|
|Location:||San Diego, CA|
|Dates:||August 2-7, 2009|
|Keywords:||Traceability, metrological timelines, measurement assurance, reference measurement system|
|Research Areas:||Metrology and Standards for Manufacturing Processes, Metrology and Standards for Manufacturing Equipment, Nanomanufacturing|
|PDF version:||Click here to retrieve PDF version of paper (669KB)|