Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Xiaohua Zhang; Kevin G. Yager; Shuhui Kang; Nathaniel J. Fredin; Bulent Akgun; Sushil K. Satija; Jack F. Douglas; Alamgir Karim; Ronald L. Jones;|
|Title:||Solvent Retention In Thin Spin-Coated Polystyrene And Poly(Methyl Methacrylate) Homopolymer Films Studied By Neutron Reflectometry|
|Published:||January 19, 2010|
|Abstract:||We utilize neutron reflectometry (NR) to probe the amount of residual solvent inside thin polystyrene (PS) and poly(methyl methacrylate) (PMMA) films spin-coated from deuterated toluene polymer solutions onto silicon substrates . The effect of thermal treatment at temperatures below and above the glass transition of PS and PMMA are examined to determine how these treatments affect the residual solvent. The parameters investigated include the total film thickness h and molecular mass M for PS and only h for PMMA. We find that relative amount of solvent in PMMA films is less than a few percent, while no detectable amount of residual solvent was found in the PS films. The residual solvent content of the PMMA films had no measureable dependence on h. These results are corroborated utilizing Fourier Transform infrared (FTIR) spectroscopy. We discuss our observations in comparison with a large body of seemingly conflicting observations on residual solvent in polymer thin films.|
|Pages:||pp. 1117 - 1123|
|Keywords:||Residual solvent, Polymer, Thin film, Neutron reflectometry|
|Research Areas:||Chemistry, Neutron Research|
|PDF version:||Click here to retrieve PDF version of paper (963KB)|