| Author(s): |
Joaquin (. Martinez; Yaw S. Obeng; Stephen Knight; |
| Title: |
Advanced Metrology for Nanoelectronics at the National Institute of Standards and Technology |
| Published: |
March 11, 2009 |
| Abstract: |
A broad range of programs at the National Institute of Standards and Technology address critical metrology and characterization challenges facing the nanoelectronics industry. A brief history of the program will be included. From these programs we will describe some exemplary projects developing new measurement and characterization techniques for nanodevices. These will include, among others, the use of helium ion microscope, spin-transfer microwave nano-oscillators, characterization of graphene, advanced atomic force microscope, and development of a microcalorimeter-based high resolution X-ray analyzer. |
| Conference: |
FDP (Flat Panel Display) China 2009 |
| Location: |
Shanghai, CH |
| Dates: |
March 11-13, 2009 |
| Keywords: |
metrology;nanotechnology;graffene;spintronics;carbon nanotubes |
| Research Areas: |
Semiconductors, Superconductors, Microelectronics |
| PDF version: |
 Click here to retrieve PDF version of paper (191KB) |
