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|Author(s):||Heather J. Patrick; Thomas A. Germer; Yifu Ding; Hyun Wook Ro; Lee J. Richter; Christopher L. Soles;|
|Title:||Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers|
|Published:||December 09, 2008|
|Abstract:||We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal using a spectroscopic ellipsometer and analyzed using a rigorous-coupled-wave model. We show excellent agreement of scatterometry results with ex situ measurements of line height by atomic force microscopy and specular x-ray reflectivity. The in situ scatterometry results reveal differences in the shape evolution of the grating lines indiscernible by other methods.|
|Citation:||Applied Physics Letters|
|Pages:||pp. 233105-1 - 233105-3|
|Keywords:||ellipsometry, nanoimprint, optics, polymers, scatterometry, semiconductors|
|Research Areas:||Nanoimprint lithography, Characterization, Nanometrology, and Nanoscale Measurements|
|PDF version:||Click here to retrieve PDF version of paper (239KB)|