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|Author(s):||Amanda N. Goyettes; G. de Hann; Yicheng Wang; Loucas G. Christophorou; James K. Olthoff;|
|Title:||Electron Transport, Ionization, and Attachment Coefficients in C2F4 and C2F4/Ar Mixtures|
|Published:||May 01, 2001|
|Abstract:||This is a summary report of the paper to be published in the Journal of Chemical Physics. Measurements of electron transport, effective ionization, and attachment coefficients are reported for C2F4. In addition, measurements of the electron drift velocity and the effective ionization coefficient as a function of the density-reduced electric field E/N are reported for mixtures of C2F4 with Ar. The measured effective ionization coefficients in C2F4/Ar mixtures indicate a contribution to these coefficients from Penning ionization at high Ar concentrations. The rate constant for electron attachment to C2F4 as well as the product of the longitudinal electron diffusion coefficient and the gas number density NDL in mixtures of C2F4 with Ar as functions of E/N are also reported.|
|Citation:||J. Chemical Physics (publ. Amer. Inst. of Physics)|
|Pages:||pp. 8932 - 8937|
|Keywords:||C2F4,drift velocity,electron attachment,electron transport coefficients,ionization|
|Research Areas:||Electronics & Telecommunications|
|PDF version:||Click here to retrieve PDF version of paper (4MB)|