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|Author(s):||Doo-In Kim; Pradeep N. Namboodiri; Frank W. DelRio; Robert F. Cook;|
|Title:||Mechanical and electrical coupling at metal-insulator-metal nano-scale contacts|
|Published:||May 22, 2008|
|Abstract:||Mechanical and electrical coupling at nano-scale metallic contacts was investigated using a conducting-probe atomic force microscope (AFM). The current-voltage responses were non-Ohmic, symmetric about zero bias, with conductance values smaller than the quantum conductance limit, which indicate electron tunneling through an insulating layer. Using a self-consistent contact mechanics model and a parabolic tunneling model for thin insulating layers, we determined the contact area, barrier height, and barrier thickness as a function of applied contact load. The results suggest the presence of two insulating layers: an oxide layer on the AFM tip and an organic contaminant layer on the metallic surface.|
|Citation:||Applied Physics Letters|
|Keywords:||atomic force microscope, electron tunneling, contact mechanics|