NIST Authors in Bold
| Author(s): | Doo-In Kim; Pradeep N. Namboodiri; Frank W. DelRio; Robert F. Cook; |
|---|---|
| Title: | Mechanical and electrical coupling at metal-insulator-metal nano-scale contacts |
| Published: | May 22, 2008 |
| Abstract: | Mechanical and electrical coupling at nano-scale metallic contacts was investigated using a conducting-probe atomic force microscope (AFM). The current-voltage responses were non-Ohmic, symmetric about zero bias, with conductance values smaller than the quantum conductance limit, which indicate electron tunneling through an insulating layer. Using a self-consistent contact mechanics model and a parabolic tunneling model for thin insulating layers, we determined the contact area, barrier height, and barrier thickness as a function of applied contact load. The results suggest the presence of two insulating layers: an oxide layer on the AFM tip and an organic contaminant layer on the metallic surface. |
| Citation: | Applied Physics Letters |
| Volume: | 93 |
| Keywords: | atomic force microscope; electron tunneling; contact mechanics |
| Research Areas: | Metals |