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Publication Citation: Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing

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Author(s): Patrick S. Lysaght; Joseph C. Woicik; Daniel A. Fischer; G K. Bersuker; Joel Barnett; Brendan Foran; H . Tseng; Raj Jammy;
Title: Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing
Published: January 15, 2007
Abstract:
Citation: Journal of Applied Physics
Volume: 101
Issue: 2
Pages: 24105 pp.
Research Areas: Advanced Materials, Materials Science
PDF version: PDF Document Click here to retrieve PDF version of paper (549KB)