Publication Citation
NIST Authors in Bold
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| Author(s): | Patrick S. Lysaght; Joseph C. Woicik; Daniel A. Fischer; G K. Bersuker; Joel Barnett; Brendan Foran; H . Tseng; Raj Jammy; |
|---|---|
| Title: | Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing |
| Published: | January 15, 2007 |
| Abstract: | |
| Citation: | Journal of Applied Physics |
| Volume: | 101 |
| Issue: | 2 |
| Pages: | 24105 pp. |
| Research Areas: | Advanced Materials, Materials Science |
| PDF version: |  Click here to retrieve PDF version of paper (536KB) |