Lysaght, P.
, Woicik, J.
, Fischer, D.
, Bersuker, G.
, Barnett, J.
, Foran, B.
, Tseng, H.
and Jammy, R.
(2007),
Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing, Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854228
(Accessed April 19, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing
Published
Author(s)
Patrick S. Lysaght, , , G K. Bersuker, Joel Barnett, Brendan Foran, H . Tseng, Raj Jammy
Citation
Journal of Applied Physics
Volume
101
Issue
2
Pub Type
Journals
Download Paper
Citation
Created January 14, 2007, Updated October 12, 2021