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Publication Citation: Quantitative depth profiling of photoacid generators in photoresist materials by near-edge x-ray absorption fine structure spectroscopy

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Author(s): Vivek M. Prabhu; S Sambasivan; Daniel A. Fischer; Linda K. Sundberg; Robert D. Allen;
Title: Quantitative depth profiling of photoacid generators in photoresist materials by near-edge x-ray absorption fine structure spectroscopy
Published: November 15, 2006
Abstract:
Citation: Applied Surface Science
Volume: 253
Issue: 2
Pages: pp. 1010 - 1014
Research Areas: Characterization, Ceramics
PDF version: PDF Document Click here to retrieve PDF version of paper (585KB)