NIST Authors in Bold
| Author(s): | Vivek M. Prabhu; B D. Vogt; Wen-Li Wu; Jack F. Douglas; Eric K. Lin; Sushil K. Satija; D M. Goldfarb; H Ito; |
|---|---|
| Title: | Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films |
| Published: | May 20, 2005 |
| Abstract: | A depth profile of the counterion concentration within thin polyelectrolyte films was measured in-situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find a substantial counterion depletion near the substrate and an enrichment near the periphery of the film extending into the solution. The film expansion extent follows a linear dependence with the segmental degree of ionization. These observations challenge our understanding of the charge distribution and swelling response in polyelectrolyte films and are important for understanding film dissolution in medical and technological applications. |
| Conference: | Abstract Book : the 3rd Kips-Nist Joint Symposium on Polymer Science- 3rd KIPS-NIST JOINT SYMPOSIUM ON POLYMER SCIENCE. |
| Location: | Kyoto, |
| Dates: | May 20-22, 2005 |
| Keywords: | Electronic Materials;Lithography;Reflectivity;Thin Films;developer;dissolution;neutron reflectivity;photoresist;polyelectrolyte;swelling |
| Research Areas: | Polymers |
| PDF version: | Click here to retrieve PDF version of paper (12KB) |