| Author(s): |
Vivek M. Prabhu; Ronald L. Jones; Eric K. Lin; Christopher L. Soles; Wen-Li Wu; D L. Goldfarb; M Angelopoulos; |
| Title: |
Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts |
| Published: |
January 01, 2003 |
| Abstract: |
|
| Conference: |
SPIE Advanced Lithography |
| Proceedings: |
Proceedings of SPIE |
| Volume: |
5039 |
| Pages: |
pp. 404 - 414 |
| Location: |
Santa Clara, CA |
| Dates: |
February 24-26, 2003 |
| Keywords: |
Copolymers;Electronic Materials;Lithography;Scattering;Solutions;additives;developer;neutron scattering;photoresist;polyelectrolyte;roughness;solvent quality |
| Research Areas: |
Polymers |
| PDF version: |
 Click here to retrieve PDF version of paper (214KB) |
