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Publication Citation: Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts

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Author(s): Vivek M. Prabhu; Ronald L. Jones; Eric K. Lin; Christopher Soles; Wen-Li Wu; D L. Goldfarb; M Angelopoulos;
Title: Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts
Published: January 01, 2003
Abstract:
Conference: SPIE Advanced Lithography
Proceedings: Proceedings of SPIE
Volume: 5039
Pages: pp. 404 - 414
Location: Santa Clara, CA
Dates: February 24-26, 2003
Keywords: Copolymers;Electronic Materials;Lithography;Scattering;Solutions;additives;developer;neutron scattering;photoresist;polyelectrolyte;roughness;solvent quality
Research Areas: Polymers
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