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|Author(s):||Peter K. Schenck; Jennifer L. Klamo; Nabil Bassim; Peter G. Burke; Yvonne B. Gerbig; Martin L. Green;|
|Title:||Combinatorial study of the crystallinity boundary in the HfO2-TiO2-Y2O3 system using pulsed laser deposition library thin films|
|Published:||May 16, 2008|
|Abstract:||HfO2-TiO2-Y2O3 is an interesting high-k dielectric system. Combinatorial library films of this system enable the study of the role of composition on phase formation as well as optical and mechanical properties. A library film of this system deposited at 400ºC exhibited a boundary line evident visually as well as in optical characterization. Mapping x-ray analysis showed the line corresponds to a crystallinity boundary, separating an amorphous phase and a FCC crystalline phase of yttrium hafnium oxide. Mapping nanoindentation across the boundary also revealed a sharp change in mechanical properties. The combinatorial technique is a powerful tool for high-throughput materials science, and by realizing this particularly unique PLD library film, allows many interesting materials phenomena and properties to be measured.|
|Citation:||Thin Solid Films|
|Pages:||pp. 691 - 694|
|Keywords:||Combinatorial, Thin films, Reflectometry, X-ray diffraction, Nanoindentation|
|PDF version:||Click here to retrieve PDF version of paper (541KB)|